We demonstrate a new design of Ge-based electrodes comprising three-dimensional (3-D) spherical microflowers containing crystalline nanorod networks on sturdy 1-D nanostems directly grown on a metallic current collector by facile thermal evaporation. The Ge nanorod networks were observed to self-replicate their tetrahedron structures and form a diamond cubic lattice-like inner network. After et...

The authors compare the effects of focused and broad MeV ion beam irradiation on the surface roughness of silicon wafers after subsequent electrochemical anodization. With a focused beam, the roughness increases rapidly for low fluences and then slowly decreases for higher fluences, in contrast to broad beam irradiation where the roughness slowly increases with fluence. This effect is important...

This work reports the preparation of a three-dimensional Si thin film negative electrode employing a porous Cu current collector. A previously reported copper etching procedure was modified to develop the porous structures inside a 9 μm thick copper foil. Magnetron sputtering was used for the deposition of an n-type doped 400 nm thick amorphous Si thin film. Electrochemical cycling of the prepa...

This paper studies parameters which affect the pore size diameter of a silicon membrane. Electrochemical etching is performed in characterise the parameter involved in this process. The parameter has been studied is volume ratio of hydrofluoric acid (HF) and ethanol as an electrolyte aqueous for electrochemical etch. This electrolyte aqueous solution has been mixed between HF and ethanol with v...

objectives: the aim of this in-vitro study was to assess the thermal effect of light emitting diode (led) light curing unit on the enamel etching time. materials and methods: three treatment groups with 15 enamel specimens each were used in this study: g1: fifteen seconds of etching, g2: five seconds of etching, g3: five seconds of etching plus led light irradiation (simultaneously). the micro ...