We have developed a fixed beam direct writing laser lithography system with a resolution of 400 nm at 457 nm wavelength and a writing speed of 4.2 mm/s with total system costs of less than 100 000 US$. Keyword: Laser lithography system

This article reports a simple, versatile approach to the fabrication of lithographically defined mesoscopic colloidal silica nanoparticle patterns over large areas using spin-coating, interferometric lithography, and reactive-ion etching. One-dimensional nanoparticle films (bands) and 2D discs, diamonds, and holes with sub-micrometer periodicity, high quality, and excellent uniformity were succ...

Novel metal oxide semiconductor field effect transistor (MOSFET) architectures aimed at sub IV operation with enhanced current driving capability are reported. In our design, the planar channel region in a conventional MOSFET is replaced by an array of isolated Si wires. Directional metal coverage of the two sidewalls and the top surface of each Si wire help achieve enhanced gate control. Sub I...

The growth of the semiconductor industry is driven by Moore’s law: “The complexity for minimum component cost has increased at a rate of roughly a factor of two per year” [1]. Notice that Moore observed that not only was the number of components doubling yearly, but was doing so at minimum cost. One of the main factors driving the improvements in complexity and cost of ICs, is improvements in p...

This paper presents the design of orientation stages for high-resolution imprint lithography machines. These machines implement a new lithography process known as Step and Flash Imprint Lithography (SFIL) and are intended for 1) sub 100 nm imprint demonstrations on flat substrates and 2) investigation of potential defect propagation during step and repeat imprinting. SFIL is an imprint lithogra...

The lithography process is the critical step in the fabrication of nanostructures for integrated circuit manufacturing. It accounts for one third of the costs of manufacturing integrated circuits. The rapid transition to smaller microelectronic feature sizes involves the introduction of new lithography technologies, new photoresist materials, and tighter processes specifications. This transitio...

A CMOS compatible direct write laser lithography technique has been developed for cantilever fabrication on pre-fabricated standard CMOS. We have developed cantilever based sensors for mass measurements in vacuum and air. The cantilever is actuated into lateral vibration by electrostatic excitation and the resonant frequency is detected by capacitive readout. The device is integrated on standar...

Here we present a large-area fabrication technique that is capable of producing size-tunable periodic silicon nanopillar arrays with sub-10 nm resolution. Our approach is to transfer the patterns created by nanosphere lithography into silicon substrates, forming nanopillar arrays and modify the size, shape and height of nanopillar arrays by various etching schemes. Introduction To construct nan...

This paper presents the design of orientation stages for high-resolution imprint lithography machines. These machines implement a new lithography process known as Step and Flash Imprint Lithography (SFIL) and are intended for 1) sub 100 nm imprint demonstrations on flat substrates and 2) investigation of potential defect propagation during step and repeat imprinting. SFIL is an imprint lithogra...

Conventional optical lithography is based on UV-light sources and illuminating photoresists through masks. Currently, the author is working on the use of evanescent waves to perform lithography, and to the best of our knowledge not used before. Evanescent Wave Lithography has some key advantages and singular capabilities as we will try to demonstrate. In particular, it can reach lower resolutio...