We investigated the deformation of the viscoelastic polymethyl methacrylene (PMMA) resist wherein a rigid SiO2 stamp with a rectangular line pattern is imprinted for thermal nano-imprint lithography (NIL). We calculated the stress distribution in the polymer resist during the molding process by finite element method (FEM). Our simulation results revealed asymmetric von Mises stress distribution...

Large-area nanopatterning technology has demonstrated high potential which can signifi‐ cantly enhance the performance of many devices and products, such as LEDs, solar cells, hard disk drives, laser diodes, display, etc [1]. For example, nano-patterned sapphire substrates (NPSS) and photonic crystals (PhC) have been considered as the most effective approaches to improve the light output effici...

Carbon microand nanostructures has received widespread interest recently due to their potential applications in biomedical devices, chemical sensors, and microelectronics. In this work, we successfully fabricated carbon-micro and nano electromechanical systems (CMEMS/NEMS) by UV/EB lithography and pyrolysis method. Our starting material is a negative photoresist, SU-8. We tried to solve chargin...

Fabrication of optical structures has evolved to a precision which allows us to control light within etched nanostructures. Nano-optic cavities can be used for efficient and flexible concentration of light in small volumes, and control over both emission wavelength and frequency. Conversely, if a· periodic pattern is defined in the top semitransparent metal layer by lithography, it is possible ...

A method to fabricate nano-ridges over a full wafer is presented. The fabrication method uses local oxidation of silicon, with silicon nitride as a mask, and wet anisotropic etching of silicon. The realized structures are 7–20 nm wide, 40–100 nm high and centimeters long. All dimensions are easily adjustable by varying the oxidation time, the wet etching time and the mask geometry, respectively...

The Scanning Probe Microscopes (SPMs) based lithographic techniques have been demonstrated as an extremely capable patterning tool. Manipulating surfaces, creating atomic assembly, fabricating chemical patterns, imaging topography and characterizing various mechanical properties of materials in nanometer regime are enabled by this technique. In this paper, a qualified overview of diverse lithog...

The resonance behavior of localized surface plasmons in silver and gold nanoparticles was studied in the visible and near-infrared regions of the electromagnetic spectrum. Arrays of nano-sized gold (Au) and silver (Ag) particles with different properties were produced with electron-beam lithography technique over glass substrates. The effect of the particle size, shape variations, period, thick...

Diffraction with asymmetric enhancement and suppression, and alternating contrast for symmetric diffraction orders is demonstrated from planar two-component optical gratings made of passive/lossy materials. Simulations agree well with the experimental diffraction pattern of the fabricated sample. Our fabrication approach uses simple, standard planar micro/nano lithography employing one photores...

In this paper we investigate for the first time the near-field optical behavior of two-dimensional Fibonacci plasmonic lattices fabricated by electron-beam lithography on transparent quartz substrates. In particular, by performing near-field optical microscopy measurements and three dimensional Finite Difference Time Domain simulations we demonstrate that near-field coupling of nanoparticle dim...

We present that a set of high order Bessel beams 0  when internally reflected at a dielectric/vacuum interface can create distinct evanescent light modes in each of which the intensity distribution is restricted to a sub-wavelength region near the interface outside the dielectric. We believe that this could really facilitate lateral optical manipulation of nano-particles and neutral atoms alon...