Anode materials of nanostructured silicon have been prepared by physical vapor deposition and characterized using electrochemical methods. The electrodes were prepared in thin-film form as nanocrystalline particles ~12 nm mean diameter! and as continuous amorphous thin films ~100 nm thick!. The nanocrystalline silicon exhibited specific capacities of around 1100 mAh/g with a 50% capacity retent...

A pulsed plasma enhanced chemical vapor deposition (PECVD) reactor is used for the preparation of thin polyacetylene films. A theoretical model based on the mass transport characteristics of the reactor is developed in order to correlate with experimentally obtained spatial deposition profiles for the acetylene plasma polymer film deposited within the cylindrical reactor. Utilizing a free radic...

We present a generalized multi-phase-field model to predict the growth of polycrystalline thin films fabricated by physical vapor deposition. The accounts for explicit transport atomic species substrate and competing diffusion processes on surface in bulk film leading formation with specific microstructures. used magnetron sputtering conditions (pressure, voltage, working distance, orientation)...

The plasma polymerization of NIPAAM and titanium isopropoxide monomers into responsive ultrathin films with responsive optical properties using plasma enhanced chemical vapor deposition is reported. The composite ultrathin films possess a large window for potential changes in their refractive index from 1.60 to 1.95. We demonstrated that these polymer films exhibit fast (transition time below 2...

Organic glass films formed by physical vapor deposition exhibit enhanced stability relative to those formed by conventional liquid cooling and aging techniques. Recently, experimental and computational evidence has emerged indicating that the average molecular orientation can be tuned by controlling the substrate temperature at which these "stable glasses" are grown. In this work, we present a ...

In this investigation, Ti/TiN nanolayer and TiN single layer coatings were coated on substrate of AISI 316L stainless steel by applying physical vapor deposition (PVD) using the type of cathodic arc evaporation (CAE). The evaluation of microstructure were carried out using x-ray diffraction (XRD), nanoindentation, atomic force microscopy (AFM) as well as scanning electron microscopy (SEM). Pola...

This paper gives some insights in the applications where PECVD nitrides can be introduced to replace the LPCVD layers and how the process parameters need to be varied to obtain the desired properties. Film properties like stress, hydrogen content, wet etch rate and deposition rate are reported. The nitrides are optimized for specific applications and examples on the influence of nitride propert...