We report x-ray photoelectron spectroscopy (XPS) analysis of native Ti target surface chemistry during magnetron sputtering in Ar/N2 atmosphere. To avoid air exposure, the target is capped immediately after sputtering with a few-nm-thick Al overlayers, hence, information about the chemical state of target elements as a function of N2 partial pressure pN2 is preserved. Contrary to previous repor...

A novel radio frequency magnetron sputtering method for the deposition of composite films which consist of chromium oxide and chromium ~Cr2O3/Cr-cermet! is presented. As an extension to conventional reactive sputtering of a Cr target in an argon and oxygen atmosphere the oxygen flow into the process chamber is switched periodically on and off. This leads to an oscillating oxygen partial pressur...

CHARACTERIZATION AND CORROSION OF BCC-TANTALUM COATING DEPOSITED ON ALUMINUM AND STEEL SUBSTRATE BY DC MAGNETRON SPUTTERING by Chirag Joshi Tantalum is one of the most versatile highly refractory corrosion-resistant metals. Tantalum coating can be used as an effective corrosion barrier if it is continuous, free from defects and it adheres well to the substrate. A DC magnetron sputtering techniq...

Titanium dioxide (titania) is widely used as a photocatalyst for its moderate band gap, high photoactivity, recyclability, nontoxicity, low cost and its significant chemical stability. The anatase phase of titania is known to show the highest photocatalytic activity, however, the presence of this phase alone is not sufficient for sustained activity. In this study TiO2 coatings were deposited on...