the effect of temperature variation on the growth of carbon nanotubes (cnts) using thermal chemical vapor deposition (tcvd) is presented. nickel and cobalt (ni-co) thin films on silicon (si) substrates were used as catalysts in tcvd technique. acetylene gas was used in cnts growth process at the controlled temperature ranges from 850-1000 ̊ c. catalysts and cnts characterization was carried out ...

Ion thrusters offer the potential to enable many future interplanetary robotic missions presently under consideration by NASA. To realize the benefits offered by these low thrust devices, the sputtering mechanisms that are responsible for the degradation of thruster components over time must be well understood. Predictions of thruster life depend directly on the material removal rates from thru...

The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). Characteristic for this technique are high energy pulses (a few Joules) of length 50-100 μs that are applied to the target (catho...

very smooth thin films of iridium have been deposited on super polished fused silica (sio2) substrates using dc magnetron sputtering in argon plasma. the influence of deposition process parameters on film micro roughness has been investigated. in addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

the improvement of the physical properties of indium tin oxide (ito) layers is quite advantageous in photovoltaic applications. in this study the ito film is deposited by rf sputtering onto p-type crystalline silicon (c-si) with (100) orientation, multicrystalline silicon (mc-si), and glass substrates coated with zno and annealed in vacuum furnace at 400°c. electrical, optical, structural and m...

We describe a sputtering system that can deposit composition spreads in an effectively UHV environment but which does not require the high-throughput paradigm to be compromised by a long pump down each time a target is changed. The system deploys four magnetron sputter guns in a cryoshroud (getter sputtering) which allows elements such as Ti and Zr to be deposited with minimal contamination by ...

The parameters of many-body tight-binding (TB) potentials have been determined for 26 fcc and bcc metallic elements. The potentials are intended for application in classical dynamics simulations of sputtering phenomena. The potentials are fitted to the cohesive energy, lattice constant, elastic constants and vacancy formation energy of each element, using a cut off beyond the second (fcc) or th...