This study reviews the majorly used chemical vapor deposition (CVD) with a focus on confined reaction configurations in which quasistatic equilibrium conditions are obtained for fabrication of graphene large size and high quality through controlled nucleation density, feedstock flux, growth rates. The confinement can also be to tune thickness, domain shape, stacking order synthetic graphene. CV...

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Nathan T. Hahn, Heechang Ye, David W. Flaherty, Allen J. Bard, and C. Buddie Mullins* Department of Chemical Engineering, Texas Materials Institute, Center for Nanoand Molecular Science, The University of Texas at Austin, 1 University Station C0400, Austin, Texas 78712 and Center for Electrochemistry, Department of Chemistry and Biochemistry, The University of Texas at Austin, 1 University Stat...

a School of Chemistry and Chemical Engineering, Zhoukou Normal University, Zhoukou 466001, China b School of Life Science and Agriculture, Zhoukou Normal University, Zhoukou 466001, China Department of Chemical and Biomedical Engineering, Center for Innovation in Gas Research and Utilization, West Virginia University, Morgantown, WV 26506, USA d School of Chemistry and Chemical Engineering, Yul...

Chemical vapor deposition (CVD) is one of the key technologies for the epitaxial crystal growth of semiconductors. In order to obtain high-performance devices, atomically controlled thin films are required. Layer by layer growth consists of various processes, i.e ., the thermal decomposition of precursors, the adsorption of growing species, their surface migration, two-dimensional nucleation, t...