Traditional dc magnetron sputtering has a low ionization rate when preparing metallic thin films. With the development of film science and market demand for material applications, it is necessary to improve density magnetron-sputtered High-power pulsed (HiPIMS) technology physical vapor deposition with high energy. Therefore, in this work, HiPIMS was applied prepare tungsten films compare surfa...

Magnetron sputtering is a widely used physical vapor deposition technique. Reactive for the of, e.g, oxides, nitrides and carbides. In fundamental research, versatility essential when designing or upgrading chamber. Furthermore, automated systems are norm in industrial production, but relatively uncommon laboratory-scale primarily research. Combining automatization computerized control with req...

The purpose of the designed reactor is (i) to obtain polycrystalline and∕or amorphous thin films by controlled deposition induced by a reactive sputtering magnetron and (ii) to perform a parallel in situ structural study of the deposited thin films by X-ray diffraction, in real time, during the whole growth process. The designed reactor allows for the control and precise variation of the releva...

An RF-assisted closed-field dual magnetron sputtering system was developed to characterize the plasma and the ionization fraction of sputtered material to provide a suitable system for depositing optical thin films on large-area substrates at low temperatures (<130 ◦C). The ‘prototype’ system consists of dual 76 mm dc magnetrons operated at both balanced and unbalanced (closed-field) configurat...

The utility of hard tribological coatings based on transition nitrides (e.g. CrN, TiAlN, CrAlN, etc.) as protective layers on various forming tools (e.g. die and its components used in high pressure die casting) has led to improvements in increased die life, reduced machine down time, and improved product quality. Moreover, recent advances in the coating design made it possible to obtain nanosc...

Multicomponent TixNbCrAl nitride films were deposited on Si(100) substrates by reactive direct current magnetron sputtering (dcMS) and high power impulse (HiPIMS) in the absence of substrate heating bias. Three single Ti, Nb, Cr50Al50 targets either driven three dc or HiPIMS supplies. The Ti content was varied tuning applied to target. composition determined ion beam analysis. nitrogen is nearl...

A process for fabricating high-quality Josephson junctions and DC SQUIDs on basis of Nb/Al technology has been developed. DC magnetron sputtering is used for the deposition of the metal layers and the barrier is formed by thermal oxidation of the Al-layer. The junction area of 5 microns x 5 microns is obtained using anodisation. Three types of Josephson tunnel junctions have been prepared: stan...