To gain insight into surface processes in plasma processing, basic ion beam experiments are performed on two representative polyatomic-ion species: hydrocarbon ions CHx 1 for deposition processes and fluorocarbon ions CFx 1 for etching processes (x51,2, . . . ). A single ion species is extracted from an inductive plasma via a mass filter and directed onto aluminum surfaces at energies ,150 eV. ...

Entropic Systems, Inc.'s enhanced particle removal process is a new technology that is being successfully applied to the cleaning of inertial guidance instrument parts. In this process, the part to be cleaned is contacted, under conditions of shear, with a solution of a high molecular weight fluorocarbon surfactant in an inert perfluorinated liquid. It is then rinsed with a volatile perfluorina...

Self-assembled monolayers (SAMs) were prepared on gold substrates from an unsymmetrical partially fluorinated spiroalkanedithiol adsorbate with the specific structure of [CH3(CH2)7][CF3(CF2)7(CH2)8]C[CH2SH]2 (SADT) and compared to SAMs formed from the semifluorinated monothiol F8H10SH [CF3(CF2)7(CH2)10SH] of analogous chain length and n-octadecanethiol. The adsorbate with two alkyl chains, one ...

Plasma processing is a standard industrial method for the modification of material surfaces and the deposition of thin films. Polyatomic ions and neutrals larger than a triatomic play a critical role in plasma-induced surface chemistry, especially in the deposition of polymeric films from fluorocarbon plasmas. In this paper, low energy CF3+ and C3F5+ ions are used to modify a polystyrene surfac...