For robust standard cell design, designers need to improve the intercell compatibility for all combinations of cells and cell placements. Multiple patterning lithography colorability check breaks the locality of traditional rule check, and N-wise checks are strongly needed to verify the colorability for layout interactions across cell boundaries. A systematic framework is proposed to evaluate t...

Enhancement of biochips and biochips scanners is a crucial issue in the actual industry that needs more sensitive and less expensive molecular analysis tools. In this aim, several points have to be re-examined: detector sensitivity, chip density, labeling. In this perspective, we have developed several different techniques based on soft lithography to pattern molecules. We also have developed a...

This paper is an overview of work in the IBM Microelectronics Division to extend electronbeam lithography technology to the projection level for use in next-generation lithography. The approach being explored—Projection Reduction Exposure with Variable Axis Immersion Lenses (PREVAIL)—combines the high exposure efficiency of massively parallel pixel projection with scanning-probe-forming systems...

Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining throughput comparable to today’s optical lithography systems. This places stringent data-handling requirements on the design of any maskless lithography system. Today’s optical lithography systems transfer one layer of data from the mask to the entire wafer in about sixty seconds. To achieve a...

Second Reader Date iii ABSTRACT Future lithography systems must produce more dense chips with smaller feature sizes, while maintaining throughput comparable to today's optical lithography systems. This places stringent data-handling requirements on the design of any maskless lithography system. Today's optical lithography systems transfer one layer of data from the mask to the entire wafer in a...

We present a Rubbery, Off-Stoichiometric Thiol-Ene-epoxy (OSTE+) polymer for direct lithography manufacturing, demonstrate its use in pneumatic pinch microvalves for lab-on-chip applications, test the lithography process achieving pillars of aspect-ratios (a.r.) 1:8, and characterize it’s surface as hydrophilic.

We have fabricated narrow channel Si-MOSFETs for electron transport studies at low temperature. The fabrication process combines optical lithography for large structures and high resolution e-beam lithography for narrow gates. The smallest working devices have a 0.14 pm wide gate. This paper reports the fabrication process and gives some examples of the quantum transport phenomena observed in t...

High-throughput fabrication of graphically encoded hydrogel microparticles is achieved by combining flow contact lithography in a multichannel microfluidic device and a high capacity 25 mm LED UV source. Production rates of chemically homogeneous particles are improved by two orders of magnitude. Additionally, the custom-built contact lithography instrument provides an affordable solution for p...

This report outlines mix-and-match of JEOL e-beam lithography and ASML stepper optical lithography. Optical gratings and waveguides are made using both machines. Systematic overlay testing is also conducted for both machines, which shows overlay offsets ranging from 400nm without process correction to 100nm with process correction per exposure.

4.1. Nanomachining with Scanning Probes 1831 4.2. Soft Lithography 1832 4.3. Embossing with Rigid Masters 1835 4.4. Near-Field Phase-Shifting Photolithography 1835 4.5. Topographically Directed Photolithography 1837 4.6. Topographically Directed Etching 1837 4.7. Lithography with Neutral Metastable Atoms 1838 4.8. Approaches to Size Reduction 1839 5. Techniques for Making Regular or Simple Patt...