Low-temperature and low-pressure plasma was investigated by OES (optical emission spectroscopy) in the range 200–1100 nm. For displaying measured emission spectra and identification of spectrum lines the software Spectrum Analyzer was used. Two modes of glow discharge present in the DC cylindrical magnetron apparatus which were previously researched by a mass spectrometer were studied by OES. T...

Usually, VO2 films prepared by a magnetron sputtering method exhibit good durability and excellent solar modulation efficiency (ΔTsol). However, its undesirable low-temperature luminous transmittan...

A helicon antenna that sits remotely outside the vacuum system is attached to a magnetron sputtering system. This increases the electron temperature, which increases the ionization of the sputter flux for achieving ionized physical vapor deposition (IPVD). There are no shadowing and contamination problems, unlike other IPVD devices with immersed coils, since the helicon antenna is outside the v...

All refractory, NbN/MgO/NbN (superconductor-insulator-superconductor) tunnel junctions have been fabricated by in situ sputter deposition. The influence ofMgO thickness (0.8-6.0 nm) deposited under different sputtering ambients at various deposition rates on current-voltage (IV) characteristics of small-area ( 30 X 30 pm) tunnel junctions is studied. The NbN/MgO/NbN trilayer is deposited in sit...

Thin film of zinc oxide (ZnO) has widely applied in many devices, such as solar cells[1], photoelectric devices[2], ferroelectric devices[3] owing to two most important properties: the direct wide bandgap of 3.37 eV at room temperature[4], and the large exciton binding energy of 60 meV[5]. As reported in the literature, the ZnO thin films have been prepared by various techniques, such as sol-ge...

This article presents the evidence for the significant effect of copper accelerating the bacterial inactivation on Ti-Nb-Ta-Zr (TNTZ) sputtered films on glass up to a Cu content of 8.3 at.%. These films were deposited by dc magnetron co-sputtering of an alloy target Ti-23Nb-0.7Ta-2Zr (at.%) and a Cu target. The fastest bacterial inactivation of E. coli on this later TNTZ-Cu surface proceeded wi...

Indium tin oxide (ITO) is widely applied as a transparent conductive oxide coating. A standard and successful industrial route of production is its deposition by magnetron sputtering from a compound (oxide) target [1]. To increase cost efficiency, it would be preferable to sputter reactively from a metal target at sufficiently high partial pressure of oxygen. However, under this condition, a sa...

The deposition of highly adherent carbon nitride (CNx) films using a pretreatment with two high power impulse magnetron sputtering (HIPIMS) power supplies in a master-slave configuration is reviewed. SKF3 (AISI 52100) steel substrates were pretreated in the environment of a high ionized Cr+Ar plasma in order to sputter clean the surface and implant Cr metal ions. CNx films were subsequently dep...

By means of thin film technology a reduction of size, cost, and power consumption of electronic circuits can be achieved. The required specifications are attained by proper design and combinations of innovative materials and manufacturing technologies. This thesis focuses on the development and fabrication of low-loss ceramic thin film devices for radio and microwave frequency applications. The...

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...