The 10 at.% Co-substituted BiFeO₃ films (of thickness 50 nm) were successfully prepared by radio frequency (r.f.) magnetron sputtering on SrTiO₃ (100) substrates with epitaxial relationships of [001](001)Co-BiFeO₃//[001](001)SrTiO₃. In this study, a single phase Co-substituted BiFeO₃ epitaxial film was fabricated by r.f. magnetron sputtering. Sputtering conditions such as Ar, O₂ gas pressure, a...

A simple and cost effective approach to stabilize the sputtering process in the transition zone during reactive high-power impulse magnetron sputtering (HiPIMS) is proposed. The method is based on real-time monitoring and control of the discharge current waveforms. To stabilize the process conditions at a given set point, a feedback control system was implemented that automatically regulates th...

Ti1-xAlxN coated tools are commonly used in high-speed machining, where the cutting edge of an end-mill or insert is exposed to temperatures up to 1100 °C. Here, we investigate the effect of Yttrium addition on the thermal stability of Ti1-xAlxN coatings. Reactive DC magnetron sputtering of powder metallurgically prepared Ti0.50Al0.50, Ti0.49Al0.49Y0.02, and Ti0.46Al0.46Y0.08 targets result in ...

Bismuth complex oxides, in particular, bismuth tungstate, have recently attracted attention as promising photocatalytic materials for water treatment processes. In the present work, photocatalytic bismuth tungstate films were prepared by pulsed direct current (DC) reactive magnetron sputtering of Bi and W targets in an Ar/O2 atmosphere onto spherically-shaped glass beads. The uniform coverage o...

Samarium (Sm) doped aluminum nitride (AlN) thin films are deposited on silicon (100) substrates at 77 K by rf magnetron sputtering method. Thick films of 200 nm are grown at 100-200 watts RF power and 5-8 m Torr nitrogen, using a metal target of Al with Sm. X-ray diffraction results show that films are amorphous. Cathodoluminescence (CL) studies are performed and four peaks are observed in Sm a...

Tungsten oxide (WOx) thin film, which is well known as an electrochromic display, was deposited on the ITO film coated flexible substrates using the RF magnetron sputtering method. Phenomena of processing plasmas, the film quality and the electrochromic properties of deposited WO3 thin film have been studied as parameters of a gas pressure and gas mixture. Experimental results suggest that depo...