This work addresses the major problem of reactive distillation (RD) processes mathematical modeling, revealing also why detecting the presence of a three-phase regime (vapour-liquid-liquid) on the column stages is of utmost importance. In this paper, the authors present in detail their starting modeling approach, which describes the behaviour of a “classic” RD process (where the potential liqui...

Chemical vapour deposition on a Cu substrate is becoming a very important approach to obtain high quality graphene samples. Previous studies of graphene growth on Cu mainly focus on surface processes. However, recent experiments suggest that gas-phase dynamics also plays an important role in graphene growth. In this article, gas-phase processes are systematically studied using computational flu...