High quality single Josephson junctions and junction arrays with 10 junctions in series have been fabricated using masked proton beam irradiation damage technology. Monte Carlo simulation of the irradiation damage profile underneath the metal mask has been carried out systematically to guide the metal mask structure design. A high resolution and high aspect ratio metal mask opening was fabricat...

This paper presents a study and the implementation of a optical simulation tool based on wavelets. After this initial study it will be possible to implement resolution enhancement techniques (RET) such as optical proximity correction (OPC) and double patterning. Optical lithography simulation is an essential step to a Design for Manufacturability (DFM) flow. Simulation is used in mask printabil...

Defect avoidance methods are likely to play a key role in overcoming the challenge of mask blank defects in EUV lithography. In this work, we propose a novel EUV mask defect avoidance method. It is the first approach that allows exploring all the degrees of freedom available for defect avoidance (pattern shift, rotation and mask floorplanning). We model the defect avoidance problem as a global,...

In this paper using the Clifford algebra over R4 and its matrix representation, we construct Clifford scaling functions and Clifford wavelets. Then we compute related mask functions and filters, which arise in many applications such as quantum mechanics.

Objective- To study the effects of Isoflurane in inducing anesthesia and comparing mask and chamber induction anesthesia in rabbits for the first trial in Iran. Design- Experimental design. Animals- 20 female adult New Zealand White rabbits. Procedures- Animals were divided randomly into two groups. A 40 cm3 Chamber was used in group A with 4-5% concentration of isoflurane and a face mask ...