The article describes significant role of catalyst in the deposition of various materials on different substrates surface via Chemical vapor deposition (CVD) process. CVD is a complex process of depositing thin coatings on a substrate surface via chemical reactions of gaseous materials. It is a useful process to produce materials of high purity, density and strength. It has emerged as a novel m...

In this paper, a laboratory chemical vapor deposition (CVD) reactor is described, which features an opposing screw rotating fluidized bed. The efficiently concentrates powdered reactants in the reaction zone while maintaining fluidization independent of powder properties. This allows for lab-scale CVD processing many small samples at high yields and without need re-adjustment parameters differe...

................................................................................................. iii Sammanfattning ..................................................................................... iv Acknowledgement ................................................................................... v List of included publications ..............................................................