The bottom-up patterning approach provides intrinsic advantages associated with unlimited resolution but is limited by the materials available for selection. A general and simple approach towards the selective deposition of poly-para-xylylenes is introduced in this communication. The chemical vapour deposition (CVD) of poly-para-xylylenes is inhibited on the high-energy surfaces of electrically...

We describe a new technique for the preparation of reactive templates of 1,2-aminopropyltriethoxysilane on silica surfaces, based on the chemical vapour deposition of silane molecules through a PMMA mask patterned by conventional electron-beam lithography. The template thickness and width are controlled down to the monolayer and 50 nm ranges respectively. These templates are successfully used f...

The reactivity of hydrogenated graphene when treated with oxidising agents, KMnO4 and KIO4 , as well as alkylated with benzyl bromide (BnBr) was studied. The probed reactions are strictly limited to the partly hydrogenated form of graphene in which most of the hydrogen atoms are located in activated benzylic/allylic positions. This, in turn, clearly demonstrates the presence of hydrogen attache...

Epitaxial layers of p-type indium phosphide (InP) have been grown by low pressure, metal organic chemical vapour deposition (LP-MOCVD) using diethylzinc (DEZn) as the p-dopant source. Proposed zinc-associated InP point defects and experimental DEZn doping data were used to formulate a point-defect equilibrium model of the Zn doping process of MOCVD InP. The model equation is contrasted with the...