A novel quantitative nano+micro-tribometer with integrated SPM and optical microscope imaging has been developed to characterize numerous physical and mechanical properties of liquid and solid thin films and coatings, with in-situ monitoring their changes during micro and nano indentation, scratching, reciprocating, rotating and other tribology tests. Both the materials properties and surface t...

Soft magnetic properties of Fe-Co-Ni-Al-Cr-Si thin films were studied. As-deposited Fe-Co-Ni-Al-Cr-Si nano-grained thin films showing no magnetic anisotropy were subjected to field-annealing at different temperatures to induce magnetic anisotropy. Optimized magnetic and electrical properties of Fe-Co-Ni-Al-Cr-Si films annealed at 200 ◦C are saturation magnetization 9.13 × 105 A/m, coercivity 79...

We have prepared and characterized a series of nonfluoro polymer composites with functional carbon additives such as graphite, candle soot and camphor soot which when mixed with EPF (Expanded Polystyrene Foam) matrices increase surface hydrophobicity. Water contact angles of >150° was observed on spin-cast composite film surfaces containing 3% camphor soot particles, compared to 89° in the abse...

Micro-engineering is increasingly interested in the use of thin films with thicknesses of less than 20nm. Before integrating these promising materials into complex Nano Electro Mechanical Systems (NEMS), their properties must be characterized. They must be transferred onto specific substrates for analysis. Current manipulation techniques are not suitable for the transfer of these thin films as ...

Zinc oxide(ZnO) is a promising material in nanotechnology applications, for example in nano-electronics and nanorobotic technology. The objectives foe our work are to study the effect of thickness on the structural, optical, electrical and mechanical properties and various susbstrates have been investigated of ZnO thin films. ZnO thin films were coated using chemical bath technique for various ...

Scanned beams of 0.1 MeV/u Au ions were employed for the bombardment of silicon oxide films thermally grown on silicon (1 0 0) substrates. Subsequently the films were etched in aqueous HF solution (1% and 4%) for various times and at different temperatures. Scanning force microscopy and transmission electron microscopy images of etched films reveal conical holes with diameters from 20 to 350 nm...

The pure elements Ti, Zr, Cr, Nb were selected to produce an TiCrZrNb alloy target and deposited thin films thereof by a reactive high vacuum DC sputtering process. Nitrogen was used as the reactive gas to deposit the nitride thin films. The effect of nitriding on the properties of the TiCrZrNbNx film was tested by changing the nitrogen ratio of the atmosphere. All of the as-deposited TiCrZrNbN...