نتایج جستجو برای: plasma enhanced atomic layer deposition
تعداد نتایج: 1089423 فیلتر نتایج به سال:
Plasma Enhanced Chemical Vapour Deposition (PECVD) is one of the main plasma processes which induce charging damage to gate oxides during the VLSI processes. All the previous studies, however, describe the charging phenomena only at the beginning of PECVD process, when a very thin oxide layer covers the metal lines. We present and analyze in this paper, a new strong charging phenomenon in the e...
Abstract Encapsulation is essential for mechanically flexible and electrically active implants as it protects them from the harsh environment inside body. Since performance longevity of depends on quality encapsulation, research continues into new better encapsulation strategies. Chemical vapour deposition can be used to deposit Parylene-C, a biocompatible polymer, at room temperature. Plasma e...
Deposition process for thin insulator used in polysilicon gate dielectric of thin film transistors are optimized. Silane and N2O plasma are used to form SiO2 layers at temperatures below 150 ºC. The deposition conditions as well as system operating parameters such as pressure, temperature, gas flow ratios, total flow rate and plasma power are also studied and their effects are discussed. The p...
A functional modification of the surface of a 96-well microplate coupled with a thin layer deposition technique is demonstrated for enhanced fluorescence-based sandwich immunoassays. The plasma polymerization technique enabling the deposition of organic thin films was employed for the modification of the well surface of a microplate. A silver layer and a plasma-polymerized film were consecutive...
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