Low-pressure plasmas offer a unique possibility of confinement, control, and fine tailoring of particle properties. Hence, dusty plasmas have grown into a vast field, and new applications of plasma-processed dust particles are emerging. During the deposition of thin amorphous films onto melamine formaldehyde (MF) microparticles in a C2H2 plasma, the generation of nanosized carbon particles was ...

Nanostructured TiO2 films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of -50 V. X-ray diffraction (XRD) analysis reveals that TiO2 films deposited on unbiased as well as biased substrates are all amorphous. Surface properties such as surface roughness and wett...

Thin layers of indium tin oxide are applied as electrical contacts in flat displays since they are conductive and optically transparent [I]. Targets are coated with IT0 by reactive magnetron sputtering. A partially reduced ITO-sputtering target is eroded by a Arlo plasma. Sputtered In and Sn atoms are oxidized within the plasma and redeposited on the substrate. During the sputtering process sma...

In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive magnetron sputtering. Chemical composition, thickness, film structure and mechanical properties of the films were investigated by means of Rutherford backscattering (RBS), electron microprobe analysis (EPMA), ball-cratering, X-ray diffraction (XRD) and ultramicroindentation, respectively. All sa...

Novel ultrathin TiO2–Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2–Cu-ions (M ) with the polyester surface due to the high fraction and density of M-ions interactin...

copper thin films with nano-scale structure have numerous applications in modern technology.  in this work, cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by dc magnetron sputtering technique at room temperature in pure ar gas. the sputtering time was considered in 4, 8, 12 and 16 min, respectively. the thickness effect on the structural, morpholo...