To properly process and reconstruct 3D ToF-SIMS data from systems such as multi-component polymers, drug delivery scaffolds, cells and tissues, it is important to understand the sputtering behavior of the sample. Modern cluster sources enable efficient and stable sputtering of many organics materials. However, not all materials sputter at the same rate and few studies have explored how differen...

The addition of properly selected elements, coupled in nanoscale multilayer structures can further enhance the properties of TiAlN coatings and bring new high performance. The incorporation of Y in the nanoscale pseudo-superlattice TiAlCrN/TiAlYN with typical period of 1.7 nm not only improves the oxidation resistance but also effectively reduces the coefficient of friction of the coating from ...

In this study, Nb2O5 ceramic was used as the target to deposit the Nb2O5 thin films on glass substrates with the radio frequency (RF) magnetron sputtering method. Different deposition temperatures and O2 ratios were used as parameters to investigate the optical properties of Nb2O5 thin films. The deposition parameters were a pressure of 5 × 10−3 Torr, a deposition power of 100 W, a deposition t...

The lithium-sputtering yield of liquid lithium as a function of sample temperature has been measured in the ionsurface interaction experiment (IIAX). Lithium sputtering is measured for Dþ, Heþ and Li bombardment at energies between 100 and 1000 eV at 45 incidence. In this work VFTRIM-3D is used to provide a qualitative physical picture of mechanisms responsible for the temperature dependence of...

It has been observed that a thin lithium film evaporated on graphite wall tiles in tokamak fusion devices acts to improve plasma conditions. The present focus is to measure the physical erosion rate of various conditions of lithiated graphite under deuterium ion bombardment to help understand this effect. Sputter yields on untreated ATJ-graphite, pure lithium, and lithium-on-ATJ-graphite have b...

Techniques for cost-efficient operation of SiNx:H systems with a capability for hydrogen passivation in a manufacturing environment are analyzed. We conclude that SiNx:H performance may be optimized by a variety of techniques, and that the cost and productivity of the deposition tool may be the determining factors in the industry’s decision for a particular technique. PECVD constitutes the curr...

The fundamental surface chemistry underlying selectivity in copper chemical vapor deposition (CVD) from COD-Cu-hfac and Cu(hfac), has been determined. Both electronic and chemistry contributions strongly influence the precursor reactivity on oxide as compared to metal surfaces. These results have important implications regarding the role of surface preparation and cleaning for initiating and ma...