Development und experimental testing of a new kind of dielectric barrier discharge flow reactors applicable for plasma-assisted chemical vapor deposition as well as surface treatment processes at atmospheric pressure are described. Using a combination of two upstream modules, a gradient mixer and a homogenizer, the reactor is fed by a laminar gas flow with an established concentration gradient ...

This paper is an attempt to synthesize nanostructured tantalum films on medical grade AISI 316L stainless steel (SS) using pulsed DC plasma assisted chemical vapor deposition (PACVD). The impact of duty cycle (17-33%) and total pressure (3-10 torr) were studied using field emission scanning electron microscopy (FESEM), grazing incidence x-ray diffraction (GIXRD), nuclear reaction analysis (NRA)...

We introduce a new chemical vapor deposition (CVD) process that can be used to selectively deposit materials of many different types. The technique makes use of the plasmon resonance in nanoscale metal structures to produce the local heating necessary to initiate deposition when illuminated by a focused low-power laser. We demonstrate the technique, which we refer to as plasmon-assisted CVD (PA...

Si-incorporated diamond-like carbon (Si-DLC) coatings ranging from 0 to 2 at % Si were deposited on Ti-alloy substrate by means of radio frequency plasma-assisted chemical vapor deposition (r.f. PACVD) technique, using a mixture of benzene (C(6)H(6)) and silane (SiH(4)) as the reaction gas. The synergy in wear and corrosion of Si-DLC coatings was investigated by tribological and electrochemical...

The diamond-like carbon (DLC) films deposited on the articulating surface of medical-grade Ti and Ti–6Al–4V were characterized. The DLC films were synthesized by r.f. plasma assisted chemical vapor deposition (PACVD) using C6H6 at 10 mTorr. For wear tests, the ball-ondisk type wear tester was employed by wearing a 5-mm diameter ruby ball against a rotating metal disk. The DLC coating dramatical...