The main features of the industry standard compact model HiSIM-HV for high-voltage MOSFETs are described. The basis of HiSIM-HV is a consistent physically correct potential determination in the MOSFET core and the surrounding drift regions, providing the high-voltage capabilities. Consequently, HiSIM-HV can accurately calculate the physical potential distribution in the entire asymmetric LDMOS ...

A neuro-fuzzy network approach is developed to model the nonlinear behavior of submicron metal-oxide semiconductor field-effect transistors (MOSFETs). The proposed model is trained and implemented as a MOSFET in a software environment. The training data are obtained through various simulations of a MOSFET Berkeley short channel insulated-gate field-effect transistor model 3 (BSIM3) in HSPICE, a...

Abstract Modeling of the electrostatic potential for fully depleted (FD) silicon-on-insulator (SOI) metal-oxide-semiconductor field effect transistor (MOSFET) is presented in this article. The modeling based on analytical solution two-dimensional Poisson’s equation obtained by using homotopy perturbation method (HPM). HPM with suitable boundary conditions results so-called general and closed-fo...

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Despite the significance of matched devices in analog circuit design, mismatch modeling for design application has been lacking. This paper addresses misconceptions about MOSFET mismatch for analog design. t mismatch does not follow a simplistic 1 ( area) law, especially for wide/short and narrow/long devices, which are common geometries in analog circuits. Further, t and gain factor are not ap...

In this paper, we have developed an explicit analytical drain current model comprising surface channel potential and threshold voltage in order to explain the advantages of the proposed Gate Stack Double Diffusion (GSDD) MOSFET design over the conventional MOSFET with the same geometric specifications that allow us to use the benefits of the incorporation of the high-k layer between the oxide l...