Computer-aided design plays a fundamental role in both top-down and bottom-up nano-system fabrication. This paper presents a bottom-up nanofilter patterning process based on DNA self-assembly. In this study we designed a new method to construct fully designed nano-filters with the pores between 5 nm and 9 nm in diameter. Our calculations illustrated that by constructing such a nano-filter we wo...

The authors present the design and fabrication of a nanophotonic waveguide and photodetector integrated device by molecular self-assembly of nanocrystal quantum dots (QD) and two different nano-gap formation techniques, namely electromigration-induced break-junction technique and electron beam lithography nano-gap patterning. A QD waveguide with 50 nm width integrated with a nano-scale QD photo...

Micro- and nano-patterned fluorescent materials are important for many photonic devices and applications. In this paper, we investigate the impact of three common lithographical techniques, deposition and removal of sacrificial masks, ultraviolet ablation, and focused ion beam milling, on self-assembled fluorophores. We find that different patterning techniques can dramatically change the fluor...

When mechanically exfoliated two-dimensional (2D) materials are used for device applications, their properties strongly depend on the geometry and number of layers present in the flake. In general, these properties cannot be modified once a device has been fabricated out of an exfoliated flake. In this work we present a novel nano-patterning method for 2D material based devices, Pulsed eBeam Ga...

In the past several years, much progresses have been made in the area of scanning probe based, parallel soft nano lithography for patterning biomolecule directly with nano-meter resolution and high degree of registration accuracy. We report the development and demonstration of arrayed soft nanolithography probes for dip pen nanolithography (DPN), scanning probe contact printing (SPCP), and mult...

Manipulation of Ag nanocrystals derived from up to 200 000 atoms was performed using the tip of a scanning tunneling microscope. By varying the scanning conditions, it was possible to move them laterally on contamination-free Si~111!-737 surfaces or to remove them. In both cases, thin Ag tracks were left behind. This demonstrates the concepts of nano patterning and nano painting with metals on ...

Direct write lithography is used in all phases of nanotechnology development activities. In research, it is utilized to create nanostructures into which functional materials can be patterned on the nano-scale. In process development, direct patterning allows the flexible creation of devices with varying features to optimize behavior. In manufacturing of semiconductors and data storage devices, ...