A large area antenna generates a plasma by both inductive and capacitive coupling; it is an electromagnetically coupled plasma source. In this work, experiments on a large area planar RF antenna source are interpreted in terms of a multi-conductor transmission line coupled to the plasma. This electromagnetic treatment includes mutual inductive coupling using the complex image method, and capaci...

A ‘primary’ RF power (H-power) at 13.56 MHz is coupled to a plasma source excited by an external double saddle field Helicon antenna. A ‘secondary’ RF power (S-power), also at 13.56 MHz but with variable phase, is additionally coupled by inserting a second antenna in contact with the plasma through one end of the source. The immersed antenna can be grounded or floating, allowing a self-bias to ...

Two types of compact microwave plasma ion sources (MWPIS) for focused ion beam (FIB) have been developed. Cavity resonator type plasma ion source is subjected to make resonant electric field in order to ignite plasma efficiently. The optimum length of resonator and antenna, and position of quartz and antenna have been designed by both simple calculation and computer simulation. The other source...

The electrostatic Faraday screen(FS) is generally used to suppress the strong electrostatic interaction between the ICRF antenna and edge plasmas near the antenna. It is recognized that FS suppresses the electrostatic field parallel to the magnetic field(E//), and particle and heat fluxes into the antenna current strap effectively. Even with FS, however, impurity generation from FS is a severe ...

Inductively coupled plasma source operating at low pressure to improve uniform and high plasma density is widely employed for microelectronic device fabrication. As the size of the inductively coupled source increases, it has the problems related to the electrical characteristic and non-uniformity. To improve the non-uniformity, the roles of the parallel resonance antenna are presented. The two...

Metal antennas currently in implementation use metallic conductor as guiding medium for electromagnetic Radiations. Plasma antennas uses ionized medium. The plasma antenna is a radiofrequency antenna formed by a plasma columns, filaments or sheets, which are excited by a surface wave. The relevance of this device is how rapidly it can be turned on and off only applying an electrical pulse. In t...

Impurity contamination and localized heat loads associated with ion cyclotron range of frequency (ICRF) antenna operation are among the most challenging issues for ICRF utilization.. Another challenge is maintaining maximum coupled power through plasma variations including edge localized modes (ELMs) and confinement transitions. Here, we report on an experimental assessment of a field aligned (...