نتایج جستجو برای: plasma cvd
تعداد نتایج: 369460 فیلتر نتایج به سال:
OBJECTIVE To study mortality in relation to fasting plasma glucose (FPG) and 2-h plasma glucose levels within the normoglycemic range. RESEARCH DESIGN AND METHODS Data from 19 European cohorts comprising 12,566 men and 10,874 women who had FPG <6.1 mmol/l and 2-h plasma glucose <7.8 mmol/l at baseline examination were analyzed. Multivariate-adjusted hazard ratios (HRs) and 95% CIs for deaths ...
Boron as thin film material is of relevance for use in modern micro- and nano-fabrication technology. In this research boron films are realized by a number physical chemical deposition methods, including magnetron sputtering, electron-beam evaporation, plasma enhanced vapor (CVD), thermal/non-plasma CVD, remote CVD atmospheric pressure CVD. Various physical, mechanical characteristics these inv...
OBJECTIVE To investigate whether hypo-adiponectinemia is present in ischemic stroke patients. METHODS This comparative study was carried out in the Biochemistry Department, Ziauddin University, Karachi, Pakistan in 2008. In this study, plasma adiponectin concentration was measured by an enzyme-linked immunosorbent assay in subjects with and without ischemic cerebrovascular disease (CVD). RE...
AIMS To examine the relations between genetic loci, plasma lipoprotein(a) [Lp(a)] levels, and cardiovascular disease (CVD) risk among diabetic patients and compare with the observations in the general population. METHODS AND RESULTS In two prospective cohorts of patients with type 2 diabetes (n= 2308) from the Nurses' Health Study and the Health Professional Follow-Up Study, we performed (i) ...
BACKGROUND Plasma calprotectin is a potential biomarker of cardiovascular disease (CVD), insulin resistance (IR), and obesity. We examined the relationship between plasma calprotectin concentrations, CVD manifestations and the metabolic syndrome (MetS) in patients with type 2 diabetes mellitus (T2DM) in order to evaluate plasma calprotectin as a risk assessor of CVD in diabetic patients without...
A combination of two methods chemical vapor deposition (CVD) diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth 100 µm-thick polycrystalline (PCD) layers on Si substrates. The bow HF CVD MW films showed opposite convex\concave trends; thus, combined material allowed reducing overall by a factor 2–3. Using initial 25 PCD layer achieving much high...
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