In order to form model aluminide coatings for studying critical issues related to their high temperature oxidation and corrosion performance, a laboratory chemical vapor deposition (CVD) procedure is being used to more rigorously control the coating process in terms of composition, purity and microstructure. One ferritic (Fe-9Cr1Mo) and one austenitic alloy (304L) were selected as substrate mat...

in this study, hydroxyapatite was coated on titanium substrates by plasma spraying process. a well-known porous and lamellar microstructure was found in the lateral and outer surface of coating. the phase composition was studied by xrd and the morphological and the microstructural aspects were investigated by scanning electron and optical microscopy. the hardness of coatings and substrates was ...

LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...

The development of new cutting tool materials during the last few years is based mainly on submicron hardmetal substrates as well as on new PVD and CVD coatings. The development of submicron and nanopowders with higher strength and higher fracture toughness solves problems in machining high-temp alloys, hard materials, and in dry cutting. Based on physical models used to calculate stress in the...

two experiments were designed to examine the effects of crude seminal plasma (csp) exposure ofejaculated and epididymal spermatozoa before freezing. experiment 1, two consecutive ejaculates werecollected (n=4) within 5 min, the second one was carried out in a tube containing fiser extender (coatedspermatozoa); by centrifugation, seminal plasma was removed from coated ejaculates. the pellets wer...