Mirage effect is contactless and non destructive method which has been used a lot to determine thermal properties of different  kind of samples , transverse photothermal deflection PTD in  skimming configuration with ccd camera  and special programs is used to determine thermal conductivity of porous silicon ps  film. Ps samples were prepared by electrochemical etching. Thermal conductivity wit...

Porous silicon samples were prepared by electrochemical etching method for different etching times. The structural properties of porous silicon (PS) samples were determined from the Atomic Force Microscopy (AFM) measurements. The surface mean root square roughness (σ rms) changes as function of porosity were studied, and the influence of etching time on porosity and roughness was studied too. U...

mirage effect is contactless and non destructive method which has been used a lot to determine thermal properties of different  kind of samples , transverse photothermal deflection ptd in  skimming configuration with ccd camera  and special programs is used to determine thermal conductivity of porous silicon ps  film. ps samples were prepared by electrochemical etching. thermal conductivity wit...

Electrochemically formed porous silicon (PS) can be released from the bulk silicon substrate by underetching at increased current density. Using this technique, two types of channels containing free-standing layers of PS were constructed, which were called multi-walled microchannels (MW Cs). They can be used in devices like microsieves, microbatteries, and porous electrodes. Two types of MW C w...

Effect of Light intensity on the I-V characteristics of LaF3/PS heterojunction has been investigated in this report. LaF3 layers have been deposited by a novel chemical bath deposition (CBD) technique. With this simple technique LaF3 produced as LaCl3 are made to react with hydrofluoric (HF) acid on the porous silicon substrate. This enables direct deposition of LaF3 on the pore walls of the po...

porous silicon (ps) samples have been prepared by electrochemical anodization of p-type silicon wafer by varying hf concentrations in the electrolytic solution. the structural, surface morphological, optical and surface composition analysis of the prepared samples were done by x-ray diffraction (xrd), scanning electron microscopy (sem), photoluminescence (pl) and fourier transform infrared (fti...

We used a combination of scanning electron microscopy, laser scanning confocal microscopy and luminescence spectroscopy to correlate the emission properties of anodized porous silicon (PS) with film morphology in samples that have undergone solvent evaporation-induced collapse of the underlying porous structure. Several PS samples were investigated as a function of the current density (J) and t...

Porous structured silicon or porous silicon (PS) powder was prepared by chemical etching of silicon powder in an etchant solution of HF: HNO₃: H₂O (1:3:5 v/v). An immersion time of 4 min was sufficient for depositing Cu metal from an aqueous solution of CuSO₄ in the presence of HF. Scanning electron microscopy (SEM) analysis revealed that the Cu particles aggregated upon an increase in metal co...

We studied an effect of the graphene oxide (GO) layer on the optical and electrical properties of porous silicon (PS) in hybrid PS-GO structure created by electrochemical etching of silicon wafer and deposition of GO from water dispersion on PS. With the help of scanning electron microscopy (SEM), atomic-force microscopy (AFM), and Fourier transform infrared (FTIR) spectroscopy, it was establis...

Thiol-functionalized porous silicon (PS) monolayer was evaluated for its possible application in As (III) adsorption. Dimercaptosuccinic acid (DMSA) attached to mesoporous silicon via amide bond linkages was used as a chelate for As (III). Two different aminosilanes namely 3-(aminopropyl) triethoxysilane (APTES) and 3-aminopropyl (diethoxy)-methylsilane (APDEMS) were tested as linkers to evalua...