Silicon thin layers are deposited on glass substrates with the thickness of 103 nm, 147 nm and 197 nm. The layers are produced with electron gun evaporation method under ultra-high vacuum condition. The optical Reectance and the Transmittance of produced layers were measured by using spectrophotometer. The optical functions such as, real and imaginary part of refractive index, real and imaginar...

silicon thin layers are deposited on glass substrates with the thickness of 103 nm, 147 nm and 197 nm. the layers are produced with electron gun evaporation method under ultra-high vacuum condition. the optical reectance and the transmittance of produced layers were measured by using spectrophotometer. the optical functions such as, real and imaginary part of refractive index, real and imaginar...