In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are characterized by XRD, AFM, Uv-visible and four-point probe analysis respectively. The results show...

Anatase TiO2 thin films were deposited in a d.c. reactive magnetron sputtering system. It was found that there is a strong dependence between anatase-rutil structures of TiO2 films and the technological conditions, the most relevant parameter being the oxygen percentage from the argon and oxygen mixture. Our measurements carried out for electrical properties of d.c. magnetron sputtering TiO2 th...

Nanocrystalline silicon thin films doped with erbium were produced by reactive magnetron RF sputtering. Their structural and chemical properties were studied by X-ray diffractometry at grazing incidence, micro-Raman, spectroscopic ellipsometry and Rutherford Backscattering Spectroscopy, respectively. Films with different crystalline fraction and crystallite size were deposited. Since the lumine...

An integrated humidity sensor system with nano-structured carbon nitride film as humidity sensing material is fabricated by a 0.8 μm analog mixed CMOS process. The integrated sensor system consists of differential humidity sensitive field effect transistors (HUSFET), temperature sensor, and operational amplifier. The process contains two poly, two metal and twin well technology. To form CNx fil...

Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...

Thin zinc oxide doped with gallium layers were prepared by rf-magnetron sputtering from nanoparticles synthesized by sol-gel method. Increasing the deposition temperature has resulted in a change of preferred orientations of (002) with an intermediate step-like structure of powder. The films showed different morphologies of the surface of the grains that are dependent on the deposition temperat...

In the present work, the deposition and characterization of dielectric, piezoelectric, semiconductor and conductor films by RF diode / RF magnetron sputtering process for applications in MEMS fabrication have been reported. Thin films of silicon dioxide, silicon nitride, amorphous silicon, zinc oxide and lanthanum doped lead zirconate titanate (PLZT) were prepared by RF sputtering process and e...

Perovskite BaTiO3 thin films have a wide range of applications for advanced devices. Especially, epitaxial BaTiO3 thin films are highly desirable for these advanced applications. So far, such epitaxial BaTiO3 films have been successfully fabricated on different single-crystal substrates using various deposition techniques including RF magnetron sputtering, molecular beam epitaxy, metallorganic ...

All refractory, NbN/MgO/NbN (superconductor-insulator-superconductor) tunnel junctions have been fabricated by in situ sputter deposition. The influence ofMgO thickness (0.8-6.0 nm) deposited under different sputtering ambients at various deposition rates on current-voltage (IV) characteristics of small-area ( 30 X 30 pm) tunnel junctions is studied. The NbN/MgO/NbN trilayer is deposited in sit...