نتایج جستجو برای: sputter deposition
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Sputter deposition processes, especially for sputtering from metal targets, are well investigated. For practical reasons, i.e. for industrial processes, energetic considerations for sputter deposition are useful in order to optimize the sputtering process. In particular, for substrates at floating conditions it is required to obtain energetic conditions during film growth that enables sufficien...
Several silicon dioxide chemical vapor deposition processes using high density plasma sources have been recently proposed in the literature [4,6] for deposition of self-planarizing inter-level dielectric deposition. All these processes exhibit the competitive effect of simultaneous deposition and etching mechanisms. In previous papers [1,2,3], a level set approach was developed for etching and ...
The effect of sulfization temperature on Ga throughfilm uniformity in a 2-reaction H2Se/H2S precursor process for Cu(InGa)(SeS)2 was studied. Cu0.8Ga0.2/In bi-layer precursors were prepared by sputter deposition. The precursors were then partially selenized at 450 oC, followed by sulfization at temperatures ranging from 450 to 550 oC. The observed threshold temperature for Ga homogenization dur...
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