Thin layers of indium tin oxide are applied as electrical contacts in flat displays since they are conductive and optically transparent [I]. Targets are coated with IT0 by reactive magnetron sputtering. A partially reduced ITO-sputtering target is eroded by a Arlo plasma. Sputtered In and Sn atoms are oxidized within the plasma and redeposited on the substrate. During the sputtering process sma...

We describe the setup, characteristics, and application of an in vacuo ion-sputtering and electron-beam annealing device for the postpreparation of scanning probes (e.g., scanning tunneling microscopy (STM) tips) under ultrahigh vacuum (UHV) conditions. The proposed device facilitates the straightforward implementation of a common two-step cleaning procedure, where the first step consists of io...

We combine laboratory and Apollo year on the moon) every surface species has been observations to describe the sputtering of the struck and subsequent ions eject chemicallylunar surface and the composition of the ejecta altered species. At high fluences sputtering with special reference to O. The atmospheric proceeds stoichiometrically (Johnson 1990). inventory appears to be dominated by microT...

Novel ultrathin TiO2–Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2–Cu-ions (M ) with the polyester surface due to the high fraction and density of M-ions interactin...

By sputtering organic films with 10 kV, 10 nA C60+ and 0.2 kV, 300 nA Ar+ ion beams concurrently and analyzing the newly exposed surface with X-ray photoelectron spectroscopy, organic thin-film devices including an organic light-emitting diode and a polymer solar cell with an inverted structure are profiled. The chemical composition and the structure of each layer are preserved and clearly obse...

The 10 at.% Co-substituted BiFeO₃ films (of thickness 50 nm) were successfully prepared by radio frequency (r.f.) magnetron sputtering on SrTiO₃ (100) substrates with epitaxial relationships of [001](001)Co-BiFeO₃//[001](001)SrTiO₃. In this study, a single phase Co-substituted BiFeO₃ epitaxial film was fabricated by r.f. magnetron sputtering. Sputtering conditions such as Ar, O₂ gas pressure, a...

The lithium-sputtering yield of liquid lithium as a function of sample temperature has been measured in the ionsurface interaction experiment (IIAX). Lithium sputtering is measured for Dþ, Heþ and Li bombardment at energies between 100 and 1000 eV at 45 incidence. In this work VFTRIM-3D is used to provide a qualitative physical picture of mechanisms responsible for the temperature dependence of...

In high-dose ion implantation for materials modification, the maximum concentration of the implanted species is determined by ion-induced erosion (sputtering) of the implanted layer. In this review, we consider the influence of preferential sputtering and atomic mixing. The maximum concentration of the implanted species is given roughly by r IS and extends over a depth W where S is the sputteri...

New sputter deposition processes, such as biased target ion beam deposition, are beginning to be used to grow metallic superlattices. In these processes, sputtering of a target material at ion energies close to the threshold for the onset of sputtering can be used to create a low energy flux of metal atoms and reflected neutrals. Using embedded atom method potentials for fcc metals and a univer...

[1] The lunar exosphere is produced by a combination of processes including thermal desorption, micrometeoroid bombardment, internal gas release, photon-stimulated desorption, and charged-particle sputtering. Here we investigate an additional mechanism not previously considered for the Moon, namely the role that newly born ions from the exosphere itself play in sputtering additional neutrals fr...