Titanium is a successful biomaterial that possesses good biocompatibility. It is covered by a surface layer of titanium dioxide, and this oxide may play a critical role in inhibiting reactive oxygen species, such as peroxynitrite, produced during the inflammatory response. In the present study, titanium dioxide was coated onto silicone substrates by radio-frequency sputtering. Silicone coating ...

While calcium phosphate-based ceramics are currently the most widely used materials in bone repair, they generally lack tensile strength for initial load bearing. Bulk titanium is the gold standard of metallic implant materials, but does not match the mechanical properties of the surrounding bone, potentially leading to problems of fixation and bone resorption. As an alternative, nickel-titaniu...

Titanium nitride thin films are used in applications such as tribological layers for cutting tools, coating of some medical devices (scalpel blades, prosthesis, implants etc.), sensors, electrodes for bioelectronics, microelectronics, diffusion barrier, bio-microelectromechanical systems (Bio-MEMS) and so on. This work is a comparative study concerning the influence of substrate temperature on ...

Ultrasonic force microscopy has been applied to the characterization of titanium nitride coatings deposited by physical vapor deposition dc magnetron sputtering on stainless steel substrates. The titanium nitride layers exhibit a rich variety of elastic contrast in the ultrasonic force microscopy images. Nanoscale inhomogeneities in stiffness on the titanium nitride films have been attributed t...

In this work, silicon nitride (Si3N4) thin films were deposited on metallic substrates (aluminium and titanium sheets) by the DC reactive sputtering technique using two different targets (n-type p-type Si wafers) as well Ar:N2 gas mixing ratios (50:50 70:30). The electrical conductivity of titanium) was measured before after deposition both surfaces substrates. results obtained from work showed...

Right angle magnetron sputtering (RAMS) was used to produce hydroxyapatite (HA) film coatings on pure titanium substrates and oriented silicon wafer (Si(0 0 1)) substrates with flat surfaces as well as engineered surfaces having different forms. Analyses using synchrotron XRD, AFM, XPS, FTIR and SEM with EDS showed that as-sputtered thin coatings consist of highly crystalline hydroxyapatite. Th...

OBJECTIVES To study the efficacy of an effective anodized titanium surface with enhanced attachment of endothelial progenitor cell (EPC). BACKGROUND In-stent restenosis is a major obstacle for vascular patency after catheter-based intravascular interventions. Recently, stents that capture EPCs have been paid attention in order to make a functional endothelialized layer at the site of stent-in...

The Two-Way Task: Run1: TAC-M, TS-M, and Tri-BM Run2: TAC-M, TS-M, and BoW-BM Run3: TAC-M, TS-M, NE-M, & Tri-BM, BoW-BM The Three-Way Task: Run1: TAC-M, TS-M, and Tri-BM, BoWBM Run2: TAC-M, TS-M, NE-M (partial), and Tri-BM, BoW-BM Run3: TAC-M, TS-M, NE-M, and Tri-BM, BoW-BM From Two-Way to Three-Way: If BoW-BM=YES & Tri-BM=NO then CONTRADICTION If BoW-BM=YES & Tri-BM=YES then ENTAILMENT Others ...

Ti films with the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Different annealing temperatures 120, 270 and 320 degree Celsius with 7 cm/sec uniform oxygen flow, were used for producing titanium oxide layers. Thin film structures were studied by AFM and XRD methods. During annealing processes rou...

Titanium thin layers with the same deposition conditions were deposited on glass substrates at room temperature. Different annealing temperatures namely, 400 K, 500 K and 600 K with uniform 9 cm /sec oxygen 3 flow were used to produce titanium oxide layers. The nano-structure of layers were studied using AFM and XRD methods. Optical Reflectance were studied by spectrophotometer method. Correlat...