Chemical etching is widely applied to texture the surface of sputter-deposited zinc oxide for light scattering in thin-film silicon solar cells. Based on experimental findings from the literature and our own results we propose a model that explains the etching behavior of ZnO depending on the structural material properties and etching agent. All grain boundaries are prone to be etched to a cert...

Corrosion resistance of iron can be drastically improved by addition of passivating alloying elements. A supersaturated solid solution of Fe-25at%Sn was produced by mechanical alloying of commercially pure iron and tin powders for 24 hours using a planetary ball mill. Electrochemical measurements were performed on cold compacted unsintered specimens.. XRD investigation on produced alloy showed ...

This study was designed to probe the fabrication of unique silver and gold nano-structures engaging a self-designed chitosan-porous anodic alumina nano-composite as a template. Porous anodic alumina has been manufactured by di-step aluminum anodization in an oxalic acid electrolytic bath. The surface properties of porous anodic alumina were reinforced by chitosan neutralized in sodium hydro...

Solid-state nanopore has captured the attention of many researchers due to its characteristic of nanoscale. Now, different fabrication methods have been reported, which can be summarized into two broad categories: "top-down" etching technology and "bottom-up" shrinkage technology. Ion track etching method, mask etching method chemical solution etching method, and high-energy particle etching an...

The synchrotron radiation (SR) stimulated etching of silicon elastomer polydimethylsiloxane (PDMS) using XeF(2) as an etching gas has been demonstrated. An etching system with differential pumps and two parabolic focusing mirrors was constructed to perform the etching. The PDMS was found to be effectively etched by the SR irradiation under the XeF(2) gas flow, and the etching process was area-s...

In this paper, a new lead-free piezoelectric (K,Na)NbO3 (KNN) film is presented as a promising, environment-friendly alternative to the conventional piezoelectric thin film materials like PZT, etc. with regard to applying into piezo-MEMS devices in general and micro-energy-harvesting devices in particular. The KNN films deposited by the RF magnetron sputtering deposition system were revealed ex...

a systematic study on the electrochemical behavior of the s-derivatives of 2-amino cyclopentene-1-dithiocarboxylic acid (acda) has been carried out in aqueous ethanolic solutions by means of polarography, coulometry and voltammetry. all the compounds studied exhibited a well defined anodic wave corresponding to a diffusion controlled process. controlled potential coulometry gave n=1 per mole fo...

High speed directional etching of non conventional materials like Quartz, Lithium Niobate and Lead Titanate is still insufficiently developed for producing high aspect ratio microstructures. Compared to deep silicon etching, the plasma etching of these materials has suffered from limitations in achievable depth, aspect ratio, verticality and smoothness of surfaces. Deep etching with nearly vert...

The realization of flat surfaces on the angstrom scale is required in advanced devices to avoid loss due to carrier (electron and/or photon) scattering. In this work, we have developed a new surface flattening method that involves near-field etching, where optical near-fields (ONFs) act to dissociate the molecules. ONFs selectively generated at the apex of protrusions on the surface selectively...

Dry etching is one of the elemental technologies for the fabrication of optical devices. In order to obtain the desired shape using the dry etching process, it is necessary to understand the reactivity of the materials being used to plasma. In particular, III-V compound semiconductors have a multi-layered structure comprising a plurality of elements and thus it is important to first have a full...