We report the development of a novel portable atomic layer deposition chemical vapor deposition (ALD/CVD) hybrid reactor setup. Unique feature of this reactor is the use of ALD/CVD mode in a single portable deposition system to fabricate multi-layer thin films over a broad range from "bulk-like" multi-micrometer to nanometer atomic dimensions. The precursor delivery system and control-architect...

Vertically aligned single-walled carbon nanotubes (SWNTs) up to 5 microns thick as shown in Fig 1 were produced by an alcohol CVD process [1]. In contrast to the first report of CVD growth of vertically aligned SWNTs [2], hydrogen gas was supplied only during the heating-up stage with the improved background vacuum condition. A time-progressive investigation of the growth process was studied by...

This study reviews the majorly used chemical vapor deposition (CVD) with a focus on confined reaction configurations in which quasistatic equilibrium conditions are obtained for fabrication of graphene large size and high quality through controlled nucleation density, feedstock flux, growth rates. The confinement can also be to tune thickness, domain shape, stacking order synthetic graphene. CV...