نتایج جستجو برای: dc magnetron sputtering
تعداد نتایج: 63723 فیلتر نتایج به سال:
This review focuses on Cu/TiO2 sequentially sputtered and Cu-TiO2 co-sputtered catalytic/photocatalytic surfaces that lead to bacterial inactivation, discussing their stability, synthesis, adhesion, and antibacterial kinetics. The intervention of TiO2, Cu, and the synergic effect of Cu and TiO2 on films prepared by a colloidal sol-gel method leading to bacterial inactivation is reviewed. Proces...
This review focuses on Cu/TiO2 sequentially and Cu-TiO2 co-sputtered catalytic/photocatalytic surfaces leading to bacterial inactivation discussing their stability, synthesis, adhesion and antibacterial kinetics. The intervention of TiO2, Cu and the synergic effect of Cu and TiO2 on films prepared by a colloidal approach and other techniques is also reviewed leading to bacterial inactivation. P...
Titanium thin films were deposited by dc magnetron sputtering. The GLancing Angle Deposition (GLAD) method was implemented to prepare two series of titanium films: perpendicular and oriented columnar structures. The first one was obtained with a conventional incidence angle of the sputtered particles ( = 0°), whereas the second one used a grazing incidence angle = 85°. Afterwards, films were an...
High power impulse magnetron sputtering (HIPIMS) of an Al target in Ar/O2 mixtures has been studied. The use of HIPIMS is shown to drastically influence the process characteristics compared to conventional sputtering. Under suitable conditions, oxide formation on the target as the reactive gas flow is increased is suppressed, and the hysteresis effect commonly observed as the gas flow is varied...
Practical experience in the use of high power impulse magnetron sputtering (HiPIMS) technology has revealed that output bias current depends on total energy cathodes, which means voltage settings do not necessarily match actual output. In this study, we investigated effects and characteristics titanium nitride thin films produced using sputtering. The values were adjusted by varying supplied ca...
In this research work, an experimental evaluation was conducted to explore the fretting fatigue life of multilayer Cr–CrN-coated AL7075-T6 alloy specimens with higher adhesion strength to substrate as the coating adhesion strength is one of the most critical issues in magnetron sputtering technique. Physical vapor deposition (PVD) magnetron sputtering technique was used for coating purpose, and...
In this work, we established a convenient while reproduceable method for stabilizer-free silver nanoparticle (AgNP)-coated micropipettes by the combination of magnetron sputtering and surface coupling agent. The clear surfaces of the AgNPs are beneficial for absorbing biological or functional molecules on their surfaces. By optimizing the operating parameters, such as sputtering current and spu...
In this paper aluminium-doped zinc oxide(ZnO:Al) conducting layer was deposited on polyethylene terephthalate(PET) substrate by r. f. magnetron sputtering method. The effects of gas pressure and r. f. sputtering power on the structural and electrical properties of ZnO:Al thin film were investigated experimentally. The results show that the resistivity of the film was strongly influenced by the ...
Structural and optical properties of ZnO1-хSх (0 ≤ x ≤ 1.0) thin films grown onto sapphire substrates (с-Al2O3) at 300 C by radio frequency (rf) magnetron sputtering of ZnS ceramic target are studied. A possibility of purposeful controlling sulfur content and, as consequence, ZnO1-хSх band gap energy via changing the ratio of the partial pressures of argon and oxygen are revealed. Linear depen...
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