The physical property changes in the plasma-polymerized fluorocarbon (PPFC) thin films near melting temperature (Tm) were investigated through chemical structure analysis. PPFC films, produced by semi-crystalline polytetrafluoroethylene (PTFE)-based polymer sputtering target, form amorphous polymers with outstanding properties, such as high water repellency and optical transmittance, electrical...

Hot Filament Chemical Vapor Deposition (HFCVD) offers the ability to tailor the chemistry of films with polymeric structure. In particular, HFCVD allows for more control over precursor fragmentation pathways than conventional plasma-enhanced CVD (PECVD). HFCVD uses thermal activation in the gas phase to generate reactive species, and allows independent control of the substrate temperature to be...

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