Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients multilayer mirrors providing maximum reflectivity in range 11.4-3.1 presented. The theoretical efficiency optics is compared different wavelengths. Keywords: lithography, optics, mirrors.

Thermal scanning probe lithography (tSPL) is a nanofabrication method for the chemical and physical nanopatterning of large variety materials polymer resists with lateral resolution 10 nm depth 1 nm. In this Primer, we describe working principles tSPL highlight characteristics that make it powerful tool to locally directly modify material properties in ambient conditions. We introduce main feat...

Abstract This work is to demonstrate a low cost and time-conserving technique create nano-trenches by transferring nano-scale polymeric sidewalls into substrate. The sidewall vertically spreading layer deposited spin-coating polymer solution on vertical template. By varying processing parameters such as the concentration or speed, dimension of can be changed, which, after pattern transfer, also...