A run-by-run feedback controller is designed for Intel manufacturing fabs to stabilize the critical dimension in the process of photolithography, in the presence of unpredictable process drift and unknown non-Gaussian disturbances. The controller is a combination of an adaptive model with an H∞ feedback.

We have proposed the heuristic Load Balancing (LB) scheduling (Shr et al., 2006a) (Shr et al., 2006b) (Shr et al., 2006c) and Multiagent Scheduling System (MSS) (Shr, et al. 2006d) approaches to provide solutions to the issue of dedicated photolithography machine constraint. The dedicated photolithography machine constraint, which is caused by the natural bias of the photolithography machine, i...

A micropatterned multilayer film, which was fabricated from layer-by-layer electrostatic self-assembly of nitrodiazoresin (NDR)/poly(acrylic acid) (PAA) followed by photolithography, was utilized as a structured template for the biomimetic mineralization of calcium carbonate. Micropatterned CaCO3 films consisting of regularly aligned calcite crystals oriented in the <104> direction were selecti...

To address the incompatibility of organic semiconductors with traditional photolithography, an inert, frozen CO(2) resist is demonstrated that forms an in situ shadow mask. Contact with a room-temperature micro-featured stamp is used to pattern the resist. After thin film deposition, the remaining CO(2) is sublimed to lift off unwanted material. Pixel densities of 325 pixels-per-inch are shown.