Reflection gratings on Al2O3 channel waveguides were defined by focused ion beam milling. Fabry-Perot microcavities were fabricated and improved performance upon annealing was demonstrated, making them viable candidates as resonators for on-chip waveguide lasers.

DENSE PERIODICAL PATTERNS IN PHOTONIC DEVICES:TECHNOLOGY FOR FABRICATION AND DEVICE PERFORMANCEbySABARISH CHANDRAMOHANDecember 2016 Advisor: Dr. Ivan AvrutskyMajor: Electrical EngineeringDegree: Doctor of Philosophy For the fabrication, focused ion beam parameters are investigated to successfullyfabricate dense periodical patterns, such as gratings, on hard transitio...

We report our recent results on an optimization study of focused ion beam (FIB) nano-structuring of Bragg gratings in Al2O3 channel waveguides. By optimizing FIB milling parameters such as ion current, dwell time, loop repetitions, scanning strategy, and applying a top metal layer for reducing charging effects and improving sidewall definition, reflection gratings with smooth and uniform sidewa...

Selective Ga + ion implantation and miring by focused ion beam exposure and subsequent wet chemical etching is used to fabricate micro/nanomechanical elements in Si. Freestanding elements with a ~ 30 nm membrane thickness are made by controlled selective underetching between unexposed and exposed areas. Ultrahigh-frequency cantilever beams have been made with resonances in the tens of MHz range...

Since the last years, Focused Ion Beam (FIB) has been growing in popularity as a microand nanofabrication tool, especially because it has shown exceptional capabilities and very high precision in both milling and depositing materials at the nanometer scale. Being a sputtering (physical) process, milling by FIB can be realized over a wide variety of materials. On the contrary, deposition involve...

We demonstrate Magnetic Force Microscopy (MFM) imaging, at room temperature in air, of a 0.25mA DC current path in a 140nm-wide gold nanowire. The nanowire was created by focused ion beam milling of a 12μm wide Cr/Au line of 20nm/110nm Cr/Au thickness. Iterative fitting of the MFM data to an idealized model of the structure yielded a nanowire resistivity a factor of 3.5 higher than that of a co...

Integration of micro-optical elements (MOEs) with optical fiber at top-end was realized by use of focused ion beam (FIB) direct milling. The designed MOEs (micro-refractive lens, microdiffractive lens with continuous relief, and micro-gratings) were directly milled by the FIB with ion energy and ion beam current of 40 keV and 569 pA, respectively, in the core area of both single mode fiber and ...

Tomography in a focused ion beam (FIB) scanning electron microscope (SEM) is a powerful method for the characterization of three-dimensional micro- and nanostructures. Although this technique can be routinely applied to conducting materials, FIB-SEM tomography of many insulators, including biological, geological and ceramic samples, is often more difficult because of charging effects that distu...

The recent development of Dual-BeamTM or Cross-BeamTM FIB systems has gradually taken over the traditional single beam FIB systems. A typical FIB column contains a liquid metal ion source that produces a finely focused Ga ion beam. The primary Ga ion beam is accelerated by 30-50 kV, and directed towards the features of interest on the specimen. The incident ion beam will sputter atoms from the ...

Highlights Focused Ion Beam Lithography is a very powerful technique for directly writing patterns on many substrates, it is a mask-less and resist-less technique that allows a very wide range of applications, providing a resolution down to 10 nm. Joined to the Electron Beam Lithography and the Gas Deposition System it became a very versatile tool for many fabrication processes. Using a dual-be...