نتایج جستجو برای: ionized cluster beam deposition

تعداد نتایج: 409113  

Journal: :Frontiers of Chemical Science and Engineering 2021

Abstract Many research works have demonstrated that the combination of atomically precise cluster deposition and theoretical calculations is able to address fundamental aspects size-effects, cluster-support interactions, reaction mechanisms materials. Although wet chemistry method has been widely used synthesize nanoparticles, gas-phase synthesis size-selected strategy was only prepare supporte...

2007
Stephan RAUSCHENBACH

The vacuum deposition of complex functional molecules and nanoparticles by thermal sublimation is often hindered due to their extremely low vapor pressure. This especially impedes the application of ultrahigh vacuum (UHV) based analytical and surface modification techniques for the investigation of these extremely interesting systems. On the other hand, specimen prepared under ambient condition...

پایان نامه :وزارت علوم، تحقیقات و فناوری - پژوهشگاه مواد و انرژی - پژوهشکده سرامیک 1386

چکیده ندارد.

2008
K Wegner P Piseri H Vahedi Tafreshi P Milani

Gas phase nanoparticle production, manipulation and deposition is of primary importance for the synthesis of nanostructured materials and for the development of industrial processes based on nanotechnology. In this review we present and discuss this approach, introducing cluster sources, nanoparticle formation and growth mechanisms and the use of aerodynamic focusing methods that are coupled wi...

Journal: :Physical chemistry chemical physics : PCCP 2014
Yuan Luo Hyun Ook Seo Martin Beck Sebastian Proch Young Dok Kim Gerd Ganteför

A new size-selected cluster deposition technique referred to as "parallel-deposition" is presented. An ion beam of multi-sized Aun clusters was spatially separated into individual cluster sizes by utilizing a Wien filter and the clusters spatially separated based on their atomic sizes were simultaneously deposited on a SiO2/Si(100) substrate. Parallel-deposited Aun clusters (n = 6, 7, and 8) on...

1999
S. D. Kovaleski R. M. Gilgenbach L. K. Ang Y. Y. Lau

The channelspark, a low accelerating voltage, high current electron beam accelerator, has been used for ablation of materials applied to thin film deposition. The channelspark operates at accelerating voltages of 10 to 20 kV with ;1500 A beam currents. The electron beam ionizes a low-pressure gas fill ~10–20 mTorr Ar or N2) to compensate its own space charge, allowing ion focused transport. Abl...

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