Titania and doped-titania coatings can be deposited by a wide range of techniques; this paper will concentrate on magnetron sputtering techniques, including "conventional" reactive co-sputtering from multiple metal targets and the recently introduced high power impulse magnetron sputtering (HiPIMS). The latter has been shown to deliver a relatively low thermal flux to the substrate, whilst stil...

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The study is aimed at the assessment of surface modification of bioresorbable polymeric material (polycaprolactone (PLC) by radio-frequency magnetron discharge plasma with hydroxyapatite target sputtering. Plasma surface modification increases its roughness, the surface free energy, hydrophilicity and enhances the growth of PCL crystallites. An increase in plasma exposure times (30, 60, 150 s) ...

Microelectronics technological processes are most complicated and consist of many un-predicted factors on the final device parameters. Thin films deposition methods based on magnetron plasma sputtering are influenced by lots of independent active factors. These deposition methods bring along uncertainty in the precise design process of electronic components. Thus, intelligent modeling process i...

pH sensors are widely used in chemical and biological applications. Metal oxides-based pH sensors have many attractive features including insolubility, stability, mechanical strength, electrocatalyst and manufacturing technology. Various metal oxide thin films prepared by radio frequency (R.F.) magnetron sputtering have attractive features, including high pH sensitivity, fast response, high res...

Amorphous carbon films with high sp content were deposited by magnetron sputtering and intense argon ion plating. Above a compressive stress of 13 GPa a strong increase of the density of the carbon films is observed. We explain the increase of density by a stress-induced phase transition of sp configured carbon to sp configured carbon. Preferential sputtering of the sp component in the carbon f...

Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined using variable angle spectroscopic ellipsometery, over the spectra range from vacuum ultraviolet...

Transition metal nitrides like CrN and TiN are widely used in automotive applications due to their high hardness and wear resistance. Recently, we showed that a multilayer architecture of CrN and TiN, deposited using the hybrid-high power impulse magnetron sputtering (HIPIMS) and direct current magnetron sputtering (DCMS)-HIPIMS/DCMS deposition technique, results in coatings which indicate not ...

The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). Characteristic for this technique are high energy pulses (a few Joules) of length 50-100 μs that are applied to the target (catho...

Mixing dielectric materials in solid-thin-film deposition allows the engineering of thin films' optical constants to meet specific thin-film-device requirements, which can be significantly useful for optoelectronics devices and photonics technologies in general. In principle, by use of radio-frequency (rf) magnetron sputtering, it would be possible to mix any two, or more, materials at differen...