نتایج جستجو برای: oxide film

تعداد نتایج: 260004  

پایان نامه :وزارت علوم، تحقیقات و فناوری - دانشگاه گیلان - دانشکده علوم پایه 1386

چکیده ندارد.

2003
Gareth Hinds J G N Thomas

The surfaces of all metals (except for gold) in air are covered with oxide films. When such a metal is immersed in an aqueous solution, the oxide film tends to dissolve. If the solution is acidic, the oxide film may dissolve completely leaving a bare metal surface, which is said to be in the active state. In near-neutral solutions, the solubility of the oxide will be much lower than in acid sol...

2003
Gareth Hinds J G N Thomas

The surfaces of all metals (except for gold) in air are covered with oxide films. When such a metal is immersed in an aqueous solution, the oxide film tends to dissolve. If the solution is acidic, the oxide film may dissolve completely leaving a bare metal surface, which is said to be in the active state. In near-neutral solutions, the solubility of the oxide will be much lower than in acid sol...

Oxidation behavior of AZ91D magnesium alloy with 3YSZ coating and aluminum interlayer was studied in air at 250 °C using electrochemical impedance spectroscopy EIS, scanning electron microscopy SEM, and X-ray diffraction XRD. The oxidation process was carried out in various duration times from 1 to 10 h. A three-electrode electrochemical cell was employed for all the EIS measurements. Also, to ...

Journal: :iranian journal of chemistry and chemical engineering (ijcce) 2006
masoomeh sharbatdaran abdoljavad novinrooz hassan noorkojouri

tungsten trioxide (wo3) films have been coated on indium thin oxide (ito) conductive glass substrate, using aqueous solution of peroxotungstic acid (pta) by the sol-gel dip coating method. x-ray diffractometery (xrd) analysis confirmed monoclinic and triclinic structure for the film and powdered wo3 respectively. fourier transforms infrared spectroscopy (ft-ir) exhibited the structure of peroxo...

علی بهاری, , ماندانا رودباری, , مونا امیرصادقی, , کبرا حسن زاده, ,

 We have grown TiO2 and AlN under ultra high vacuum and high pressure conditions and studied their structures with using AES and SEM techniques. The obtained results show that an amorphous film of TiO2 and AlN could be formed on silicon substrate. Furthermore, TiO2 and AlN are high – K dielectric materials and they can thus be replaced to ultra thin gate oxide film.

2014
Marcia Regina Salvadori Cláudio Augusto Oller Nascimento Benedito Corrêa

The synthesis of nickel oxide nanoparticles in film form using dead biomass of the filamentous fungus Aspergillus aculeatus as reducing agent represents an environmentally friendly nanotechnological innovation. The optimal conditions and the capacity of dead biomass to uptake and produce nanoparticles were evaluated by analyzing the biosorption of nickel by the fungus. The structural characteri...

2015
Woobin Lee Seungbeom Choi Kyung Tae Kim Jingu Kang Sung Kyu Park Yong-Hoon Kim

We report a derivative spectroscopic method for determining insulator-to-semiconductor transition during sol-gel metal-oxide semiconductor formation. When an as-spun sol-gel precursor film is photochemically activated and changes to semiconducting state, the light absorption characteristics of the metal-oxide film is considerable changed particularly in the ultraviolet region. As a result, a pe...

1997
N. R. Rueger J. J. Beulens M. Schaepkens M. F. Doemling J. M. Mirza T. E. F. M. Standaert G. S. Oehrlein

It has been found that in the etching of SiO2 using CHF3 in an inductively coupled plasma reactor of the planarized coil design, a thin steady state fluorocarbon film can play an important role in determining the rate of etching. This etching is encountered as the amount of bias power used in the SiO2 etching process is increased, and a transition from fluorocarbon film growth on the SiO2 to an...

2003
D. Chandler-Horowitz N. V. Nguyen

The ellipsometric film thickness measurement precision for equivalent oxide thickness as prescribed by the International Technology Roadmap for Semiconductors is quite high. Although short-term precision on a single ellipsometric instrument can be quite high, deviations of measured film thickness from instrument-to-instrument and from lab-to-lab for short-term and long-term periods of time need...

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