We propose a Load Balancing (LB) scheduling approach to tackle the load balancing issue in the semiconductor manufacturing system. This issue is derived from the dedicated photolithography machine constraint. The constraint of having a dedicated machine for the photolithography process in semiconductor manufacturing is one of the new challenges introduced in photolithography machinery due to na...

As demonstrated by means of DNA nanoconstructs, as well as DNA functionalization of nanoparticles and micrometre-scale colloids, complex self-assembly processes require components to associate with particular partners in a programmable fashion. In many cases the reversibility of the interactions between complementary DNA sequences is an advantage. However, permanently bonding some or all of the...

Photolithography is the most complicated, accurate, expensive process in manufacture of integrated circuits. The lithography machine one critical equipment photolithographic process, which used to duplicate circuit construction onto wafer. DUVL dominant photolithography technology at present for node among 714nm, while EUVL has been applied semiconductor devices beyond 7nm. main components are ...

4.1. Nanomachining with Scanning Probes 1831 4.2. Soft Lithography 1832 4.3. Embossing with Rigid Masters 1835 4.4. Near-Field Phase-Shifting Photolithography 1835 4.5. Topographically Directed Photolithography 1837 4.6. Topographically Directed Etching 1837 4.7. Lithography with Neutral Metastable Atoms 1838 4.8. Approaches to Size Reduction 1839 5. Techniques for Making Regular or Simple Patt...

Novel metrology has been developed for measuring in-situ film thickness and absorption coefficient simultaneously. Designed specifically for photolithography processes, this metrology, if applied to photoresist films, can measure thickness and photoactive compound concentration in-situ, which are important parameters for photolithography process control and diagnosis.

This manuscript describes a convenient method for the fabrication of freestanding, microperforated membranes in photocurable polymers using only one step of photolithography. We used photosensitive prepolymers to make the membranes and photolithography to define the micropatterns. We demonstrated the fabrication of single- and multilayer microperforated membranes in SU-8 photoresist and Norland...