We discuss a custom built hybrid physical chemical vapour deposition (HPCVD) system for MgB2 ultra-thin film deposition: construction, deposition process development, and optimization. Achieved films on SiC substrates have a critical temperature (Tc) ranging from 35K (10nm thick films) to 41K (40nm thick films). The 20nm thick unpatterned film had a room temperature resistivity of 13μΩ·cm, wher...

In this study, physical vapor deposition (PVD) Ti-Cr-N coatings were deposited at two different temperatures 100 and 400ºC on hardened and tempered tool steel substrates. The influence of the applied deposition temperature on the physical and mechanical properties of coatings such as roughness, thickness, phase composition, hardness and Young’s modulus were evaluated. Phase compositions were st...

In this paper, we present a simulation of chemical vapor deposition with metallic bipolar plates. In chemical vapor deposition, a delicate optimization between temperature, pressure and plasma power is important to obtain homogeneous deposition. The aim is to reduce the number of real-life experiments in a given CVD plasma reactor. Based on the large physical parameter space, there are a hugh n...

Mots-clé PVD-CVD, Sol-gel processing, Monte Carlo simulation, thin film islanding. PACS 04A25 The synthesis of self-organized quantum dots (QD’s) can be achieved through bottom up layer by layer deposition processes as chemical vapor deposition (CVD) or physical vapor deposition (PVD). However, QD’s may also be synthesized via sol-gel route, which involves a spontaneous evolution from thin film...

chemical vapor deposition (cvd) is one of the most popular methods for producing carbon nanotubes (cnts). the growth rate of cnts based on cvd technique is investigated by using a numerical model based on finite volume method. inlet gas mixture, including xylene as carbon source and mixture of argon and hydrogen as carrier gas enters into a horizontal cvd reactor at atmospheric pressure. in thi...

Since the introduction of electron beam (EB) physical vapour deposition (PVD) thermal barrier coatings (TBCs) and their application to moving components in the hot gas stream, erosion has become a prime concern. EB PVD TBCs, due to their unique columnar microstructure are far more strain tolerant than their plasma sprayed (PS) counter parts and can thus be used under more exacting operating con...

Last 2 to 3 decades application of PVD (physical vapour deposition) hard coatings exponentially grows. However, the use of hard, thin films in the field of machine elements is the exception rather than the rule. The main problem lies in the relatively high contact pressure and the very complex loading of machine components, which demand a hard resistance surface and a tough core. In seminar it ...

Highly granular YBaCuO films on SrTlO, substrates wlth T,,,-90K and J,>lO' A/cm2 were prepared by non-vacuum aerosol deposition. The optical response for these films was investigated on a 10 x 10 pm2 mlcrobrldge. Besides a bolometrlc response around the transition temperature, a sharp response peak was observed at low temperature and high bias current using a He-Ne laser (0.63pm wavelength) lll...

At the beginning of the seventies, a break-through took place in the telecommunication research. The introduction of Chemical Vapour Deposition technology in the manufacture of optical fibres allowed both technical quality and economical convenience to realise optical networks, thus beginning the telecommunication revolution. Since that moment, a great development of the CVD techniques has been...