Although a number of methods using scanning probe lithography to pattern graphene have already been introduced, the fabrication of real devices still faces limitations. We report graphite patterning using scanning probe lithography with control of the gas environment. Patterning processes using scanning probe lithography of graphite or graphene are normally performed in air because water molecu...

Thermal scanning probe lithography is a direct-write patterning method that uses heated tip to remove thermal resist. The most widely used resist polyphthalaldehyde. Another alternative resist, Parylene C introduced in this letter. It has been found wide process latitude as under our experimental conditions. A high resolution of ∼40 nm can be achieved optimised process. In addition, patterns pa...

In this paper we demonstrate atomic-scale lithography on hydrogen terminated Ge(001). The lithographic patterns were obtained by selectively desorbing hydrogen atoms from a H resist layer adsorbed on a clean, atomically flat Ge(001) surface with a scanning tunneling microscope tip operating in ultra-high vacuum. The influence of the tip-to-sample bias on the lithographic process have been inves...

Here we present a large-area fabrication technique that is capable of producing size-tunable periodic silicon nanopillar arrays with sub-10 nm resolution. Our approach is to transfer the patterns created by nanosphere lithography into silicon substrates, forming nanopillar arrays and modify the size, shape and height of nanopillar arrays by various etching schemes. Introduction To construct nan...