The influence of the aluminum nitride (AlN) film texture on the chemical etching in KOH solution was invested. The AlN films with the different texture and crystal quality were prepared by sputtering. It is found that the chemical etching behaviors, including the etch rate, the activation energy, the surface morphology and the anisotropy, are strongly dependent on the film texture. There is a f...

We report an accessible and simple method of producing 'black silicon' with aspect ratios as high as 8 using common laboratory equipment. Gold was sputtered to a thickness of 8 nm using a low-vacuum sputter coater. The structures were etched into silicon substrates using an aqueous H2O2/HF solution, and the gold was then removed using aqua regia. Ultrasonication was necessary to produce columna...

We attempt to design and fabricate of a 4×4 Butler matrix for short-millimeter-wave frequencies by using the microfabrication process polytetrafluoroethylene (PTFE) substrate-integrated waveguide (SIW) synchrotron radiation (SR) direct etching PTFE addition metal film sputter deposition. First, dimensions SIW rectangular through-holes G-band (140-220 GHz) operation are determined, cruciform 90 ...

Dissociative adsorption phenomena often occur in various fields of engineering, such as oxidation-reduction reactions, cleaning, adhesion, plating, plasma etching, sputtering, and tribology. These phenomena that involve surface reactions have attracted much attention and are analyzed both experimentally and numerically. However, when the surface has structures on the molecular scale, and the sc...