The development of scalable synthesis techniques for optically transparent, electrically conductive coatings is in great demand due to the constantly increasing market price and limited resources of indium for indium tin oxide (ITO) materials currently applied in most of the optoelectronic devices. This work pioneers the scalable synthesis of transparent conductive films (TCFs) by exploiting th...

In this paper, the transparent conductive aluminum-doped zinc oxide (ZnO: Al, AZO) thin films with different annealing conditions are studied. The AZO thin films were prepared on the Coring glass substrate by RF magnetron sputtering. The AZO thin films were annealed in atmosphere of vacuum and hydrogen at temperatures from 100 to 400°C in steps of 100°C for 1 min, respectively, to investigate t...

We report the reduction of graphene oxide (G-O) films on Al foil using hydrogen as a reducing agent generated during the etching of Al foil in an aqueous solution of hydrochloric acid (HCl). Complete etching of the Al substrate results in simultaneous reduction and a free standing film composed of stacked and overlapped reduced graphene oxide (RG-O) platelets. Generation of hydrogen at the G-O/...

Transparent and conductive/semiconductive undoped indium oxide (InOx) thin films were deposited at room temperature. The deposition technique used is the radio frequency (rf) plasma enhanced reactive thermal evaporation (rf-PERTE) of indium (In) in the presence of oxygen. The influence of oxygen partial pressure on the properties of these films is presented. The oxygen partial pressure varied b...

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Sn doped ZnO thin films have been deposited on c-cut sapphire single crystal substrates at 200°C by pulsed electron beam deposition. The kinetic energies of the ions in the plasma plume determined from ion probe measurements, present a relatively broad distribution of the energies from a few eV to one hundred eV. Sn doped ZnO films have a graded composition, with a slightly in-depth variation o...

MOCVD method has been used to grow optical coatings: Sc2O3 is a high index transparent coating while Ta-doped SnO2 is a transparent conductive oxide. Both films show dense packing and excellent properties. The influence of deposition temperature on the microstructure evolution and optical properties of Sc2O3 films was investigated by X-ray diffraction, scanning electron microscopy and spectroph...

Different ZnO nanostructured films were electrochemically grown, using an aqueous solution based on ZnCl2, on three types of transparent conductive oxides grow on commercial ITO (In2O3:Sn)-covered glass substrates: (1) ZnO prepared by spin coating, (2) ZnO prepared by direct current magnetron sputtering, and (3) commercial ITO-covered glass substrates. Although thin, these primary oxide layers ...

Microelectronics technological processes are most complicated and consist of many un-predicted factors on the final device parameters. Thin films deposition methods based on magnetron plasma sputtering are influenced by lots of independent active factors. These deposition methods bring along uncertainty in the precise design process of electronic components. Thus, intelligent modeling process i...