Building materials can release a wide range of pollutants, particularly the volatile organic compounds (VOCs) and formaldehyde, which can cause indoor air related health problems. Bake-out technology is a cost-efficient method to reduce emissions of toxic substance from building materials in residential housing units. The temperature rise and the bake-out performance of MDF panels were evaluate...

A Pall Maxi-Gaskleen purifier of the Pall AresKleen family of gas purification products was evaluated for its efficacy in reducing oxygen impurities in a silicon germanium (SiGe) deposition process for a strained silicon application at a major IDM in the US. Impact on process parameters such as hydrogen pre-bake temperature and interfacial/within-film oxygen concentration were studied as a func...

In July 2020, during the COVID-19 pandemic, Monash University Library in Melbourne, Australia, and Penn State Libraries Pennsylvania, USA, leveraged their previously established international sister-library partnership to host a virtual engagement event focused on promoting selected special collections at both institutions. The Monash–Penn Great Rare Books Bake Off, friendly competition collabo...

Based on results from previous experiments, the hypothesis is are given, with accented syllables in capitals and the relevant tested that there is an interaction between final lengthening and material underlined: accentual lengthening in Dutch, but not in English. To this end, a production experiment was run for both languages with accented (1) a. English and unaccented words in three positions...

The perpetual advancement of materials and equipment for microlithography has resulted in reduction of critical dimensions to scales approaching the size of the molecules that constitute a photoresist. As a result, molecular scale effects such as line edge roughness have become an increasing concern for resist manufacturers and process engineers alike. Computer simulation of lithography has bec...

A high frequency ultrasonic technique has been developed to monitor photoresist processing in situ during semiconductor manufacturing. Photoresist pre-exposure bake and development have been monitored using the sensor, and the post-exposure bake has been studied as well. The in situ glass transition temperature (Tg ) was determined during the prebake for I-line films down to O.6im as well as fo...

Page 1 Scope . . . . . . . . . . . . . . . . . . . . . . . . 2 2 Field of application . . . . . . . . . . . . . . . . . . . 2 3 Reference . . . . . . . . . . . . . . . . . . . . . . . 2 4 Definitions . . . . . . . . . . . . . . . . . . . . . . . . 2 5 Sampling . . . . . . . . . . . . . . . . . . . . . . . 3 5.1 Sample preparation . . . . . . . . . . . . . . . . . 3 5.2 RSS time planning . . . ....