ZnOTe compounds were grown by DC magnetron cosputtering from pure Tellurium (Te) and Zinc (Zn) cathodes in O2/Ar atmosphere. The applied power on the Zn target was constant equal to 100 W, while one Te took two values, i.e., 5 W 10 W. Thus, sample series obtained which variable parameter distance targets substrate. Sample compositions determined Rutherford Backscattering Spectroscopy (RBS) expe...

We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented ...

Amorphous Ni–Ag films were obtained on liquid nitrogen cooled Si substrates using DC magnetron sputtering. A series of magnetic and magneto-transport property measurements confirm that the film with Ni to Ag atomic ratio of 60:40 is an alloy of the two elements immiscible in equilibrium, with atomic-level intermixing. The magnetic properties of the new alloy are discussed in comparison with tho...

The structure and nanoscale mechanical properties of Ni48.8Mn27.2Ga24 thin film fabricated by DC magnetron sputtering are investigated systematically. The thin film has the austenite state at room temperature with the L21 Hesuler structure. During nanoindentation, stress-induced martensitic transformation occurs on the nanoscale for the film annealed at 823 K for 1 hour and the shape recovery r...

We provide a convenient recipe for fabricating reliable superconducting microbolometers as acoustic phonon detectors with sub-nanosecond response, using imagereversal optical lithography and dc-magnetron sputtering, and our recipe requires no chemical or plasma etching. Our approach solves the traditional problem for granular aluminium bolometers of unreliable (i.e., non-Ohmic) electrical conta...

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...

We have deposited weakly textured substoichiometric NbB2-x thin films by magnetron sputtering from a NbB2 target. The films exhibit superhardness (42 ± 4 GPa), previously only observed in overstoichiometric TiB2 thin films, and explained by a self-organized nanostructuring, where thin TiB2 columnar grains hinder nucleation and slip of dislocations and a B-rich tissue phase between the grains pr...

Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function argon gas pressure using optical emission spectroscopy (OES). Delays in discharge and the formation comb-like current waveforms due to splitting pulsing were observed with decrease pressure. This observation corresponds evolution from MPPMS condition deep-oscillation-magnetron-sputtering (DOMS)-like b...

a cylindrical direct current magnetron sputtering coater with two targets for deposition of multilayer thin films and cermet solar selective surfaces has been constructed. the substrate holder was able to rotate around the target for obtaining the uniform layer and separated multilayer phases. the al/ cu multilayer film was deposited on the glass substrate at the following conditions: working g...

Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...