High quality single Josephson junctions and junction arrays with 10 junctions in series have been fabricated using masked proton beam irradiation damage technology. Monte Carlo simulation of the irradiation damage profile underneath the metal mask has been carried out systematically to guide the metal mask structure design. A high resolution and high aspect ratio metal mask opening was fabricat...

Focused ion beam (FIB) milling is an emerging technology that enables fast, reliable and well-controlled nanometer-size feature definition. Since the method involves physical removal of material by a beam of ions, the technique can be adapted and optimized almost for any material system. Recently we have reported on an optimized approach of FIB nano-structuring, which enabled patterning of DBR ...

Electron holography is used to measure electrostatic potential profiles across reverse-biased Si p-n junctions in situ in the transmission electron microscope. A novel sample geometry based on focused ion-beam milling is developed, and results are obtained for a range of sample thicknesses and bias voltages to allow the holographic contrast to be interpreted. The physical and electrical nature ...

We outline some of the possible applications of nanotechnology to modern molecular biology and discuss several technologies that can be used to make nanoscale confining environments (channels or post arrays) for long polymers such as DNA. A particular emphasis is placed on making large arrays using nonelectron beam lithography methods. We then discuss how focused ion beam (FIB) milling can be u...

TM , using focused ion beam technology has been characterized. To date, most microfabrication in this material has used UV lithography and UV lasers, with minimum feature size of around 10µm determined by the grain structure, though there has been some recent work using high energy proton irradiation. Focused ion beam technology offers two potential advantages: features are etched directly with...

We report tensile experiments on Ni80P20 metallic glass samples fabricated via a templated electroplating process and via focused ion beam milling, which differed only in their surface energy states: Ga-ion-irradiated and as-electroplated. Molecular dynamics simulations on similar Ni80Al20 systems corroborate the experimental results, which suggest that the transition from brittle to ductile be...

The use of a combined Focussed Ion Beam/Environmental Scanning Electron Microscope (FIB/ESEM) offers new possibilities for imaging complex heterogeneous polymeric structures. The use of the focussed ion beam, using positively charged gallium ions in conjunction with a measured ‘defocused’ low energy primary electron beam has permitted milling through the heterostructure to be achieved in a cont...

Hydrogen silsesquioxane (HSQ) has been used as e-beam resist and ion milling mask in the fabrication of spin valve devices. The excellent performance of HSQ in patterning nanometer size features and corresponding procedures such as chemical mechanical polishing (CMP) make the HSQ-based process a reliable and economic way to make nanomagnetic devices.